Transparent conductive materials (TCMs) has always been playing a significant role in electronic and photovoltaic area, due to its prominent optical and electronic properties. To render those transparent materials highly conductive, efficient n-and p-type doping is critically needed to obtain high concentration of free electron and hole carriers. Despite extensive research over the past five decades, highquality p-type doping of wide-band-gap transparent materials remains a challenge. Here, we summarize four proposed design principles to enhance the p-type conductivity of these wide band gap materials, including (i) reducing the formation energy of the acceptors to enhance the dopant concentration; (ii) lowering the ionization energy and, hence, increasing the ionization of the acceptors to increase the concentration of the free holes; (iii) increasing the VBM of the host material to approaching the pinned Fermi level; and (iv) suppressing the compensating donors to shifting the pinning Fermi level toward the VBM. For each mechanism, we discuss in detail its underlying physics and provided some examples to illustrate the design principles. From this review, one could learn the doping principles and have a strategic mind when designing other p-type materials.