Beyond a Linker: The Role of Photochemistry of Crosslinkers in the Direct Optical Patterning of Colloidal Nanocrystals

Lu, Shaoyong; Fu, Zhong; Li, Fu; Weng, Kangkang; Zhou, Likuan; Zhang, Lipeng; Yang, Yuchen; Qiu, Hengwei; Liú, Dan; Qing, Wenyue; Ding, He; Sheng, Xing; Chen, Menglu; Tang, Xin; Duan, Lian; Liu, Wenyong; Wu, Longjia; Yang, Yixing; Zhang, Hao; Li, Jinghong

doi:10.1002/anie.202202633

Cited by 42 publications

(52 citation statements)

References 49 publications

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“…We ascribed the decreased PLQYs to the photodamages and the interactions of nitrene radicals with QD surfaces, though convincing explanation needs more in-depth analysis. 18 This observation is different from a recent work by Kang and co-workers, 16 where QD films photo-crosslinked with the same bisPFPA showed no noticeable changes in PLQYs. These may arise from the differences in core/shell structures of QDs and the photopatterning parameters.…”

Section: Resultscontrasting

confidence: 76%

“…Reduced PLQYs (∼40% reduction relative to the pristine value) were observed for samples after UV exposure. We ascribed the decreased PLQYs to the photodamages and the interactions of nitrene radicals with QD surfaces, though convincing explanation needs more in-depth analysis . This observation is different from a recent work by Kang and co-workers, where QD films photo-cross-linked with the same bisPFPA showed no noticeable changes in PLQYs.…”

Section: Resultsmentioning

confidence: 99%

“…developed a material-adapted strategy for direct photopatterning of NCs, termed as DOLFIN . This strategy relies on the chemical transformation of photoactive (mostly photodecomposable) surface ligands of NCs and the UV light-triggered alteration in NC colloidal stability. − Similarly, we and others showed that direct photopatterning of NCs can be achieved by cross-linking their native surface ligands under UV irradiation. − Both methods use workflows and infrastructures of well-established photolithography but do not involve conventional photoresists. These resist-free, direct photopatterning approaches yield NC patterns with microscale lateral precision in a parallel fashion, supporting the fabrication of patterned thin-film electronic and optoelectronic devices with high performance. − In this regard, the combination of NCs and photoactive ligands/additives can be viewed as the inorganic and functional version of photoresists .…”

mentioning

confidence: 99%

“…This mainly originates from the strong optical absorption of NCs (especially quantum dots, or QDs) and thus the limited light penetration depth at the exposure wavelength (typically UV or blue light). Consequently, thick NC layers that are essential for enhanced light absorption/photoluminescent (PL) conversion for optoelectronics and delicate optical engineering for photonics need multiple patterning cycles in a stepwise manner. , Additionally, the chemical and photophysical properties of NCs and devices are sensitive to prolonged UV light exposure, posing another challenge for the direct photopatterning strategy. , …”

mentioning

confidence: 99%

“…7,14 Additionally, the chemical and photophysical properties of NCs and devices are sensitive to prolonged UV light exposure, posing another challenge for the direct photopatterning strategy. 18,19 In this work, we develop a direct thermal patterning approach for NCs via thermally activated ligand chemistry (or TALC). This method yields high-fidelity NC patterns with tunable heights from nanometers to over 10 μm.…”

mentioning

confidence: 99%

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Direct Patterning of Colloidal Nanocrystals via Thermally Activated Ligand Chemistry

Chen

et al. 2022

ACS Nano

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Precise patterning with microscale lateral resolution and widely tunable heights is critical for integrating colloidal nanocrystals into advanced optoelectronic and photonic platforms. However, patterning nanocrystal layers with thickness above 100 nm remains challenging for both conventional and emerging direct photopatterning methods, due to limited light penetration depths, complex mechanical and chemical incompatibilities, and others. Here, we introduce a direct patterning method based on a thermal mechanism, namely, the thermally activated ligand chemistry (or TALC) of nanocrystals. The ligand cross-linking or decomposition reactions readily occur under local thermal stimuli triggered by near-infrared lasers, affording high-resolution and nondestructive patterning of various nanocrystals under mild conditions. Patterned quantum dots fully preserve their structural and photoluminescent quantum yields. The thermal nature allows for TALC to pattern over 10 μm thick nanocrystal layers in a single step, far beyond those achievable in other direct patterning techniques, and also supports the concept of 2.5D patterning. The thermal chemistry-mediated TALC creates more possibilities in integrating nanocrystal layers in uniform arrays or complex hierarchical formats for advanced capabilities in light emission, conversion, and modulation.

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Section: Resultscontrasting

confidence: 76%

Section: Resultsmentioning

confidence: 99%

mentioning

confidence: 99%

mentioning

confidence: 99%

mentioning

confidence: 99%

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Direct Patterning of Colloidal Nanocrystals via Thermally Activated Ligand Chemistry

Chen

et al. 2022

ACS Nano

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Direct Photolithography Patterning of Quantum Dot‐Polymer

Guo,

Chen,

et al. 2023

Adv Funct Materials

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For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

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Optical Microlithography of Perovskite Quantum Dots/Organic Semiconductor Heterojunctions for Neuromorphic Photosensors

Wu,

Dai,

Liu

et al. 2024

Adv Funct Materials

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Heterojunctions of perovskite quantum dots (QDs) and organic semiconductors (OSCs) can synergistically leverage the unique optoelectronic properties of different functional components to fabricate advanced optoelectronic devices, such as neuromorphic photosensors, by low‐cost solution processes. However, a long‐lasting challenge remains in micropatterning high‐density perovskite QDs/polymer OSCs heterojunction array with high yield and reliability due to the fragility of functional layers to organic solvents. High‐density and micro‐structure patterned organic neuromorphic photosensor arrays based on OSCs and QDs are thus rarely reported. Here, an effective cross‐linking microlithography strategy is reported to fabricate perovskite QDs/OSCs microstructure arrays. The fabricated CsPbBr3 QDs/(poly(2,5‐(2‐octyldodecyl)−3,6‐diketopyrrolopyrrole‐alt‐5,5‐(2,5‐di(thien‐2‐yl) thieno [3,2‐b] thiophene) (DPPDTT) planer heterojunctions phototransistor array presents minor device‐to‐device variation, high density (6500 devices cm−2), and high yield (almost 100%). The device array exhibits impressive merits as a neuromorphic photosensor, including a photosensitivity of 3.02 × 107, a responsivity up to 1.92 × 104 A W−1, a detectivity exceeding 1014 Jones, and a persistent photoconductivity. Moreover, an energy consumption as low as 27.9 aJ is achieved at an operating voltage of −0.0001 V. The potential application of the heterojunction neuromorphic photosensor array in motion perception is demonstrated in conjunction with a neural network.

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Beyond a Linker: The Role of Photochemistry of Crosslinkers in the Direct Optical Patterning of Colloidal Nanocrystals

Cited by 42 publications

References 49 publications

Direct Patterning of Colloidal Nanocrystals via Thermally Activated Ligand Chemistry

Direct Patterning of Colloidal Nanocrystals via Thermally Activated Ligand Chemistry

Direct Photolithography Patterning of Quantum Dot‐Polymer

Optical Microlithography of Perovskite Quantum Dots/Organic Semiconductor Heterojunctions for Neuromorphic Photosensors

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