2011
DOI: 10.1166/jnn.2011.5048
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BiFeO<SUB>3</SUB> Films Doped in the A or B Sites: Effects on the Structural and Morphological Properties

Abstract: Metal-Organic Chemical Vapor Deposition (MOCVD) has been applied to the fabrication of BiFeO3 films undoped and doped with Ba or Ti on SrTiO3 (100) and YSZ (100) substrates. The films have been deposited using a multi-metal source, consisting of the Bi(phenyl)3, Fe(tmhd)3 and Ba(hfa)2 tetraglyme or Ti(tmhd)2(O-iPr)2 (phenyl = -C6H5, H-tmhd = 2,2,6,6-tetramethyl-3,5-heptandione; O-iPr = iso-propoxide; H-hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme = CH3O(CH2CH2O)4CH3) precursor mixture. The structu… Show more

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Cited by 9 publications
(8 citation statements)
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“…High quality films have been deposited by pulsed laser deposition (PLD), [24][25][26][27] but most of the time chemical solution deposition, 27,28 sputtering 29,30 and solgel processes 31,32 have been used. The metal-organic chemical vapor deposition (MOCVD) has been less investigated for the deposition of BFO films, [33][34][35][36] despite being very appealing in regard to homogeneous deposition on large substrates, easy up-scaling possibility, and a large choice of available substrates and precursors. This paper presents the doping at the A-site of BiFeO3 thin film with dysprosium and the optimization of the MOCVD process.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…High quality films have been deposited by pulsed laser deposition (PLD), [24][25][26][27] but most of the time chemical solution deposition, 27,28 sputtering 29,30 and solgel processes 31,32 have been used. The metal-organic chemical vapor deposition (MOCVD) has been less investigated for the deposition of BFO films, [33][34][35][36] despite being very appealing in regard to homogeneous deposition on large substrates, easy up-scaling possibility, and a large choice of available substrates and precursors. This paper presents the doping at the A-site of BiFeO3 thin film with dysprosium and the optimization of the MOCVD process.…”
Section: Introductionmentioning
confidence: 99%
“…Metal-organic chemical vapor deposition (MOCVD) has been less investigated for the deposition of BFO films, [33][34][35][36] despite being very appealing with regard to homogeneous deposition on large substrates, easy up-scaling possibility, and a large choice of available substrates and precursors.…”
Section: Introductionmentioning
confidence: 99%
“…Different deposition techniques have been used to obtain thin films of BiFeO 3 , and their derived systems [14][15][16]. Most of the synthetic routes continue to rely on expensive single crystal substrates, such as SrTiO 3 , SrTiO 3 :Nb, and LaAlO 3 [17,18], but recently flexible or even bendable substrates are investigated [19].…”
Section: Introductionmentioning
confidence: 99%
“…Metal‐Organic Chemical Vapor Deposition (MOCVD) has demonstrated potential advantages over alternative deposition methods, such as physical vapor deposition (PVD) techniques, due to its good conformity and easy control over materials composition. MOCVD has been already applied to the deposition of pure BiFeO 3 films but, to our knowledge, there are only two report on the MOCVD deposition of BiFeO 3 films doped with Ba or Ti …”
Section: Introductionmentioning
confidence: 99%
“…Single‐species doped films are deposited using a mixed tri‐metallic source mixture consisting, in addition to the Bi(phenyl) 3 and Fe(tmhd) 3 complexes, of the Dy(hfa) 3 diglyme, Ba(hfa) 2 tetraglyme or Ti(tmhd) 2 (O‐iPr) 2 (Hhfa = 1,1,1,5,5,5‐hexafluoro‐2,4‐pentanedione, diglyme = 1‐Methoxy‐2‐(2‐methoxyethoxy)ethane; tetraglyme = 2,5,8,11,14‐Pentaoxapentadecane, O‐iPr = iso‐propoxide) to yield the Bi (1–x) (Dy) x FeO 3 , Bi (1–x) (Ba) x FeO 3 or BiFe 1–y (Ti) y FeO 3 films, respectively . The applicability of the present approach has been tested for the synthesis of the double‐doped system Bi (1–x) Ba x Fe (1–y) Ti y O 3 using a tetra‐metallic source containing the four different precursors…”
Section: Introductionmentioning
confidence: 99%