Crystalline silicon heterojunction solar cells based on hole-selective MoO X contacts provide obvious merits in terms of the decent passivation and carrier selectivity but face the challenge of long-term stability. With the aim to improve the performance and stability of solar cells with full area MoO X / metal contacts, a SiO X tunneling layer on silicon surface is intentionally formed by UV/O 3 treatment and an indium tin oxide (ITO) film is sputtered as a high-work-function electrode. Before ITO sputtering, an ultrathin V 2 O X capping layer is introduced to efficiently prevent MoO X film from air exposure and the damage by sputtering bombardment. The insertion of SiO X , V 2 O X , and ITO keeps the work function of MoO X at a high level, which improves the hole selectivity as well as the stability of the contact. The p-Si/SiO X /MoO X / V 2 O X /ITO/Ag solar cell demonstrates an efficiency of 20.0% with improved stability, which is the highest value for MoO X heterocontacts class on p-type silicon to date.