Forces in Scanning Probe Methods 1995
DOI: 10.1007/978-94-011-0049-6_58
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Biomolecule Photoimmobilization: Application in Scanning Probe Microscopy

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Cited by 2 publications
(2 citation statements)
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“…The height of the Fab‘-SH layer is 4.4 nm larger than the fluorinated alkanethiolate monolayer in the grids (∼1.5−2 nm 12 ). This value is consistent with the molecular dimensions of Fab‘-SH determined by others after accounting for image distortions that arise from the finite size and shape of the probe tip . This magnitude in the change in topography was observed in images of several samples and for different locations on each sample.…”
Section: Resultssupporting
confidence: 90%
“…The height of the Fab‘-SH layer is 4.4 nm larger than the fluorinated alkanethiolate monolayer in the grids (∼1.5−2 nm 12 ). This value is consistent with the molecular dimensions of Fab‘-SH determined by others after accounting for image distortions that arise from the finite size and shape of the probe tip . This magnitude in the change in topography was observed in images of several samples and for different locations on each sample.…”
Section: Resultssupporting
confidence: 90%
“…In a parallel approach, Bhatia and co-workers exposed a glass substrate modified with a thiol-terminated silane to ultraviolet light to create surfaces that resisted protein adsorption because of the highly hydrated, anion-terminated groups formed from the photochemistry. , Ultraviolet light has also been used to remove non-thiol silanes from selective portions of a SiO 2 surface to create hydrophobic/hydrophilic surface patterns used to prepare two-dimensional antibody arrays . In addition, photoactive cross-linking reagents can be used to pattern the spatial composition of a surface. This approach has been employed for the generation of protein/enzyme nanostructures using an ultraviolet laser-generated interference pattern for the activation of photobiotin . Although not extensively used at present, we expect a significant expansion in the use of this technology …”
Section: Photolithographymentioning
confidence: 99%