Block Copolymer Orientation Control Using a Top-Coat Surface Treatment

Seshimo, Takehiro; Bates, Christopher M.; Dean, Leon M.; Cushen, Julia D.; Durand, William J.; Maher, Michael J.; Ellison, Christopher J.; Willson, C. Grant

doi:10.2494/photopolymer.25.125

Cited by 16 publications

(19 citation statements)

References 21 publications

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“…In recent work, this challenge was addressed specifically for block copolymers based on poly(4-trimethylsilylstyrene), PTMSS, by designing a polarity-switching top-coat that tailors the interfacial energy at the top of the film to induce perpendicular orientation of the domains. [13][14][15][16] Conventional DSA relies on chemical patterns to guide the self-assembly of BCPs. [17][18][19][20] Scaling DSA below 20 nm pitch involves much more than just a higher χ BCP; the fabrication of the 4 chemical contrast pattern presents resolution challenges.…”

Section: Introductionmentioning

confidence: 99%

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

Cushen

Wan

Blachut

et al. 2015

ACS Appl. Mater. Interfaces

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The directed self-assembly (DSA) of two sub-20 nm pitch silicon-containing block copolymers (BCPs) was accomplished using a double-patterned sidewall scheme in which each lithographic prepatterned feature produced two regions for pattern registration. In doing so, the critical dimension of the lithographic prepatterns was relaxed by a factor of 2 compared to previously reported schemes for DSA. The key to enabling the double-patterned sidewall scheme is the exploitation of the oxidized sidewalls of cross-linked polystyrene formed during the pattern transfer of the resist via reactive ion etching. This results in shallow trenches with two guiding interfaces per prepatterned feature. Electron loss spectroscopy was used to study and confirm the guiding mechanism of the double-patterned sidewalls, and pattern transfer of the BCPs into a silicon substrate was achieved using reactive ion etching. The line edge roughness, width roughness, and placement error are near the target required for bit-patterned media applications, and the technique is also compatible with the needs of the semiconductor industry for high-volume manufacturing.

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Section: Introductionmentioning

confidence: 99%

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

Cushen

Wan

Blachut

et al. 2015

ACS Appl. Mater. Interfaces

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“…A number of such silicon-containing BCPs have been reported together with detailed demonstrations of their performance and promise. These include polystyrene- block -polydimethylsiloxane, − polydimethylsiloxane- block -polylactide, , polydimethylsiloxane- block- poly(methyl methacrylate), polylactide- block -polydimethylsiloxane- block -polylactide, polystyrene- block -poly(4-trimethylsilylstyrene)- block -polystyrene, , polystyrene- block -poly(4-trimethylsilylstyrene), − polystyrene- block -poly(4-pentamethyldisilylstyrene), poly(4-methoxystyrene)- block -poly(4-trimethylsilylstyrene), , poly(4-methoxystyrene)- block -poly(4-pentamethyldisilylstyrene), poly(4-trimethylsilylstyrene)- block -polylactide, , polystyrene- block -polytrimethylsilylisoprene, and poly(3,4-methylenedioxystyrene)- block -poly(4-pentamethyldisilylstyrene) …”

Section: Introductionmentioning

confidence: 99%

Unusual Thermal Properties of Certain Poly(3,5-disubstituted styrene)s

et al. 2020

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During the course of studying silicon-containing diblock copolymers, it was discovered that poly(3,5di(trimethylsilyl)styrene)-block-poly(3,4-methylenedioxystyrene) (PDTMSS-b-PMDOS) showed very unusual thermal properties. The material can be recovered as a free-flowing powder despite heating above 250 °C. To better understand this behavior, homopolymers of the 3,5-disubstituted styrenes, poly(3,5-di(trimethylsilyl)styrene) (PDTMSS) and poly(3,5-di-tert-butylstyrene) (PDtBS), were prepared. These polymers are soluble in common organic solvents and formed clear, glassy thin films upon spin coating. These homopolymers were studied by differential scanning calorimetry (DSC), broadband dielectric spectroscopy (BDS), dynamic mechanical analysis (DMA), and temperature-programmed ellipsometry. These experiments document the lack of a conventional glass transition in these materials below their decomposition temperature. A series of statistical copolymers of PDTMSS and PDtBS with styrene was synthesized and studied by DSC in an attempt to establish the T g of the homopolymers by model-based extrapolation.

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“…For example, the lower surface energy of inorganic blocks can make it necessary to increase the number of etching steps for the pattern transfer due to the presence of preferential wetting layers at both air/polymer and substrate/polymer interfaces [ 92 ]. High-χ BCPs usually present low tolerance to high temperatures and tend to organize differently on the substrate surface than at the air surface, commonly requiring solvent annealing [ 93 , 94 , 95 ] or an overcoat of polymer to assure structures are standing up in the final BCP film [ 84 , 96 , 97 ].…”

Section: Principles Of the Dsa Of Block Copolymersmentioning

confidence: 99%

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

et al. 2020

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Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.

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Block Copolymer Orientation Control Using a Top-Coat Surface Treatment

Cited by 16 publications

References 21 publications

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

Unusual Thermal Properties of Certain Poly(3,5-disubstituted styrene)s

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

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