2013
DOI: 10.1007/s10043-013-0031-4
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Blue laser lithography for making antireflective submicron structures on silicon

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Cited by 2 publications
(4 citation statements)
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“…The geometric distribution, size, and period of the nano-Au can be easily tuned by modulating the power and duration of the pulsed blue laser beam. Compared with other commercial lithography systems, the blue laser lithography system is compact and cost-effective.…”
Section: Resultsmentioning
confidence: 99%
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“…The geometric distribution, size, and period of the nano-Au can be easily tuned by modulating the power and duration of the pulsed blue laser beam. Compared with other commercial lithography systems, the blue laser lithography system is compact and cost-effective.…”
Section: Resultsmentioning
confidence: 99%
“…Compared with other commercial lithography systems, 21 the blue laser lithography system is compact and cost-effective.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…It makes researchers attach importance to self-cleaning and corrosion resistance performances that the active devices are often used in harsh environments including winds, dust storms and acid rains. Various designs of micro-/nano-structures, such as gratings [8], pores [9], nanocones [10], nanotips [11], nanowires [12] and paraboloids [13], have been fabricated to develop antireflective coatings based on the light trapping effect [14][15][16] and the effective medium theory (EMT) [17][18][19]. Brückner et al [20] reported the sub-wavelength structures with patterned cones displayed less than 2% reflectance in the range of 3 μm -5 μm.…”
Section: Introductionmentioning
confidence: 99%