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We discuss phase-space delocalization for the rigid rotor within a semiclassical context by recourse to the Husimi distributions of both the linear and the 3Danisotropic instances. The Husimi function can be viewed in a variety of ways. In particular, we obtain it as the expectation value of the density operator in a suitable basis of coherent states. Our treatment is based upon the concomitant Fisher information measures. The pertinent Wehrl entropy is also investigated in the linear case.

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Articles you may be interested inFabrication of wafer-scale nanopatterned sapphire substrate by hybrid nanoimprint lithography J. Vac. Sci. Technol. B 32, 06FG06 (2014); 10.1116/1.4898778 Process-simulation system for UV-nanoimprint lithography J. Vac. Sci. Technol. B 28, C6M108 (2010); 10.1116/1.3511789Lift-off process using bilayer ultraviolet nanoimprint lithography and methacryloxypropyl-terminatedpolydimethylsiloxane-based imprint resin Thermal modeling of extreme ultraviolet and step and flash imprint lithography substrates during dry etchIn this study, an imprint lithography technique was performed to transfer patterns onto indium tin oxide ͑ITO͒-coated poly͑ethylene terephthalate͒ ͑PET͒ substrates by embossing an etch barrier on the substrates and curing them under irradiation at room temperature. The etch barriers containing glycidyl methacrylate were spectrally analyzed to verify that they were deposited on the ITO-PET substrates firmly and rapidly with minimum variation in dimensions. To fabricate the ITO patterns, the substrate was etched by reactive-ion etching to eradicate the residual layers and by wet etching to carve the undisplaced ITO lines. Scanning electron microscopy observation and profilometric analysis for these processes showed only about 2% of linewidth shrinkage after polymer cross linking, easily compensated in mask design in applications. Also, the 150 nm of ruled features on the pattern were successfully transferred using the same resist. Moreover, the flexible ITO patterns illuminated the practical electroluminescence device, verifying that UV-curing imprint lithography is feasible for patterning ITO-PET surfaces.