Bond–Detach Lithography: A Method for Micro/Nanolithography by Precision PDMS Patterning

Thangawng, Abel L.; Swartz, Melody A.; Glucksberg, Matthew R.; Ruoff, Rodney S.

doi:10.1002/smll.200500418

Cited by 52 publications

(49 citation statements)

References 36 publications

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“…A wide variety of lithographic techniques have been developed for fabricating 3D structures (1)(2)(3)(4)(5), such as soft lithography (6) that allows one to develop lab-on-chip devices with applications ranging from organic light emitting diode to biology and biochemistry (7). Among others, "capillary-force lithography" is able to nicely pattern polymers at nano-/microscale, but with a very low aspect ratio, in a single step and avoiding the use of external forces (8).…”

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confidence: 99%

3D lithography by rapid curing of the liquid instabilities at nanoscale

Grilli

Coppola

Vespini

et al. 2011

Proc. Natl. Acad. Sci. U.S.A.

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In liquids realm, surface tension and capillarity are the key forces driving the formation of the shapes pervading the nature. The steady dew drops appearing on plant leaves and spider webs result from the minimization of the overall surface energy [Zheng Y, et al. (2010) Nature 463:640-643]. Thanks to the surface tension, the interfaces of such spontaneous structures exhibit extremely good spherical shape and consequently worthy optical quality. Also nanofluidic instabilities generate a variety of fascinating liquid silhouettes, but they are however intrinsically short-lived. Here we show that such unsteady liquid structures, shaped in polymeric liquids by an electrohydrodynamic pressure, can be rapidly cured by appropriate thermal treatments. The fabrication of many solid microstructures exploitable in photonics is demonstrated, thus leading to a new concept in 3D lithography. The applicability of specific structures as optical tweezers and as novel remotely excitable quantum dots-embedded microresonators is presented.A wide variety of lithographic techniques have been developed for fabricating 3D structures (1-5), such as soft lithography (6) that allows one to develop lab-on-chip devices with applications ranging from organic light emitting diode to biology and biochemistry (7). Among others, "capillary-force lithography" is able to nicely pattern polymers at nano-/microscale, but with a very low aspect ratio, in a single step and avoiding the use of external forces (8). Other approaches generate self-patterned structures by using destabilizing forces produced by electric fields, namely electrohydrodynamic (EHD) lithography (9). In EHD lithography, amazing polymeric patterns have been reported, demonstrating the possibility of controlling the process with high accuracy. This method appears suitable only for a few types of periodic patterns having a relatively low aspect ratio (i.e., pillars, dots, and lines). In fact, the control of liquid film instabilities is a demanding task as very little perturbations could drag the nanofluidic system toward nonfully predictable configurations. Such occurrence, for high aspect-ratio features, would prevent the achievement of the expected final steady state. The EHD lithography is usually performed at temperatures above the glass transition of the polymer film [typically polystyrene or poly (methyl methacrylate)], obtaining permanent microstructures by slow annealing and successive cooling, taking hours (10-13).In general, the hydrodynamic techniques produce steadystate structures resulting from the equilibrium state of a specific fluidic effect. Conversely, the core of our approach consists in "rapid-curing" temporary structures, which evolve continuously under specific fluidic instabilities, by a fast heating procedure. The interesting aspect of this approach is that it gives access to very intriguing fluid shapes, occurring in unsteady fluid physics at nanoscale, which could be very useful in modern science. As investigated recently, breakup of viscoelastic filaments...

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confidence: 99%

3D lithography by rapid curing of the liquid instabilities at nanoscale

Grilli

Coppola

Vespini

et al. 2011

Proc. Natl. Acad. Sci. U.S.A.

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“…A range of methods such as wet-chemical etching, reactive-ion etching [5,6], light induced patterning [7], decal transfer microlithography [8], the bond-detach method [9], and printand-peel [10] approaches (such as photo-copying [6] and solid-object printing [11,12]) have been utilised for creating patterns in PDMS through the use of a master. However for the former case, one of the most commonly used approaches for the structuring of PDMS for such applications is through the creation of a pattern in either a photoresist (SU8), or in a film of SiO2 or Si3N4 or metal on a Si or SiO2 substrate to produce a master mould that is used to cast the PDMS [1,3,13].…”

Section: Introductionmentioning

confidence: 99%

Rapid and mask-less laser-processing technique for the fabrication of microstructures in polydimethylsiloxane

Sones

Katis

Mills

et al. 2014

Applied Surface Science

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We report a rapid laser-based method for structuring polydimethylsiloxane (PDMS) on the micron-scale. This mask-less method uses a digital multi-mirror device as a spatial light modulator to produce a given spatial intensity pattern to create arbitrarily shaped structures via either ablation or multi-photon photo-polymerisation in a master substrate, which is subsequently used to cast the complementary patterns in PDMS. This patterned PDMS mould was then used for micro-contact printing of ink and biological molecules.

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“…It is also difficult to pattern PDMS directly with photolithography owing to its high elongation ratio and mechanical compliance properties (Harkness et al, 2004). The recently reported bond-detach lithography method successfully demonstrated nano-size patterning (Thangawng et al, 2007). All these removable-type patterning techniques of PDMS are, however, applicable only to very thin PDMS membranes.…”

Section: Introductionmentioning

confidence: 99%

Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF₂as a reaction gas

Chiang¹,

Makimura²,

He³

et al. 2009

J Synchrotron Radiat

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The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF 2 as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was found to be effectively etched by the SR irradiation under the XeF 2 gas flow, and the etching process was area-selective and anisotropic. An extremely high etching rate of 40-50 mm (10 min) À1 was easily obtained at an XeF 2 gas pressure of 0.2-0.4 torr. This suggests that SR etching using XeF 2 gas provides a new microfabrication technology for thick PDMS membranes, which can open new applications such as the formation of three-dimensional microfluidic circuits.

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Bond–Detach Lithography: A Method for Micro/Nanolithography by Precision PDMS Patterning

Cited by 52 publications

References 36 publications

3D lithography by rapid curing of the liquid instabilities at nanoscale

3D lithography by rapid curing of the liquid instabilities at nanoscale

Rapid and mask-less laser-processing technique for the fabrication of microstructures in polydimethylsiloxane

Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF₂as a reaction gas

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Bond–Detach Lithography: A Method for Micro/Nanolithography by Precision PDMS Patterning

Cited by 52 publications

References 36 publications

3D lithography by rapid curing of the liquid instabilities at nanoscale

3D lithography by rapid curing of the liquid instabilities at nanoscale

Rapid and mask-less laser-processing technique for the fabrication of microstructures in polydimethylsiloxane

Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF2as a reaction gas

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Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF₂as a reaction gas