In this paper we describe a general method to avoid stress-induced buckling of thin and large freestanding membranes. We show that using properly designed supports, in the form of nanobeams, it is possible to reduce the out-of-plane deflection of the membrane while maintaining its stiffness. As a proof of principle, using silicon-on-insulator (SOI) platform, we realized 30-µm-wide, 220-nm-thick, free-standing Si membranes, supported by four 15-µm-long and 3-µm-wide nanobeams. Using our approach, we were able to achieve out-of-plane deformation of the membrane smaller than 50 nm in spite of 39 MPa of compressive internal stress. Our method is general, and can be applied to different material systems with compressive or tensile internal stress.