2005
DOI: 10.1007/s10853-005-0522-1
|View full text |Cite
|
Sign up to set email alerts
|

Boron-doped zinc oxide thin films prepared by sol-gel technique

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

1
21
1

Year Published

2008
2008
2019
2019

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 44 publications
(23 citation statements)
references
References 16 publications
1
21
1
Order By: Relevance
“…The broadened diffraction peaks with increasing B content imply a decrease in crystallite size. In the case of B doping (which is trivalent), the concentration of the zinc interstitials is reduced for charge compensation, resulting in suppressed ZnO grain growth and deteriorated crystallinity [25]. The similar XRD features for B doped ZnO films have been observed by Addonizio and Diletto [17] using low-pressure metalorganic chemical vapor deposition (LP-MOCVD) technique and Kim et al [26] using liquid source misted chemical vapor deposition (LSMCD) method.…”
Section: Structural and Morphological Properties Of The Undoped And Bsupporting
confidence: 53%
See 1 more Smart Citation
“…The broadened diffraction peaks with increasing B content imply a decrease in crystallite size. In the case of B doping (which is trivalent), the concentration of the zinc interstitials is reduced for charge compensation, resulting in suppressed ZnO grain growth and deteriorated crystallinity [25]. The similar XRD features for B doped ZnO films have been observed by Addonizio and Diletto [17] using low-pressure metalorganic chemical vapor deposition (LP-MOCVD) technique and Kim et al [26] using liquid source misted chemical vapor deposition (LSMCD) method.…”
Section: Structural and Morphological Properties Of The Undoped And Bsupporting
confidence: 53%
“…B doped ZnO films can be deposited by several methods such as metal organic chemical vapor deposition [16,17], DC sputtering [18], pulsed laser deposition (PLD) [19], chemical vapor deposition technique [20], spray pyrolysis [21,22], vacuum arc plasma evaporation [23], and sol gel [24,25]. Among these methods, the sol gel method is one of the most commonly used method for preparation of transparent and conducting oxides owing to its simplicity, safety, non-vacuum system of deposition and hence inexpensive method for large area coatings.…”
Section: Introductionmentioning
confidence: 99%
“…The well-cleaned substrates (glass or fluorine-doped tin oxide (FTO)) were dip-coated using freshly prepared polymer sol and then baked at 80°C for 15 min to get the PVK films. In the case of ZnO thin films, the sol was prepared [6] using the following procedure: isopropyl alcohol (136.4 ml) and diethanolamine (5.2 ml) were stirred for 15 min at room temperature; then, zinc acetate dehydrate (13.38 g) was added and stirred once again for 60 min then refluxed at 70°C for 30 min, cooled, and aged for 6 h. The use of metal acetate instead of the commonly used alkoxides will reduce the problem of moisture sensitivity like significant factors in assessing the effectiveness of a process. A commercially available flat motor with a fan which is able to rotate at 2,000 rpm on 12 V DC supply was used to spin coat the ZnO sol on the substrates.…”
Section: Methodsmentioning
confidence: 99%
“…Tahar and Tahar [19] used sol-gel dip coating method and investigated the electrical and optical properties of multilayer transparent conducting boron doped ZnO films according to various deposition parameters. Houng et al [20] reported the effect of pH of precursor sol on the crystallization, microstructure, electrical and optical properties of sol-gel derived boron doped ZnO oxide transparent conducting thin films.…”
Section: Introductionmentioning
confidence: 99%