2004
DOI: 10.1016/j.jcrysgro.2003.08.049
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Boron oxide encapsulated Bridgman growth of high-purity high-resistivity cadmium telluride crystals

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Cited by 16 publications
(8 citation statements)
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“…It was found that both dislocation density and inclusion density depend on the composition of the sample. High resistivity samples, corresponding to a deviation of about 0.003 atoms% show an EPD of 2x10 4 cm -2 and an inclusion density of about 300-900 cm -2 . …”
Section: Discussionmentioning
confidence: 98%
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“…It was found that both dislocation density and inclusion density depend on the composition of the sample. High resistivity samples, corresponding to a deviation of about 0.003 atoms% show an EPD of 2x10 4 cm -2 and an inclusion density of about 300-900 cm -2 . …”
Section: Discussionmentioning
confidence: 98%
“…The details of the growth of CdTe crystals by the Boron Oxide encapsulated Bridgman were given elsewhere [4]. The Boron contamination, as determined by mass spectroscopy analysis, is less then 1 ppma.…”
Section: Methodsmentioning
confidence: 99%
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“…In this communication we report for the first time on the effect of this etching technique on CdTe crystals. CdTe crystals were grown from the melt by Boron Oxide encapsulated Bridgman method [13]. The feed charge was obtained by high pressure synthesis from 7N pure Cd and Te [14] followed by a thermal treatment [15] in order to obtain the desired composition.…”
Section: Introductionmentioning
confidence: 99%
“…2 Experiments CdTe crystals were grown both by the physical vapour transport (PVT) method and by the liquid encapsulated Bridgman method [10]. The stoichiometry of the feed charge was carefully con-trolled according to the procedure described in [11] in order to obtain crystals with different values of conductivity (both n-and p-type).…”
mentioning
confidence: 99%