Boronization in DIII-D

Jackson, G.L.; Winter, J.; Burrell, K.H.; DeBoo, J. C.; Greenfield, C. M.; Groebner, R. J.; Hodapp, T.; Holtrop, K.L.; Kellman, A. G.; Lee, R.; Lippmann, S.; Moyer, R. A.; Phillips, J. C.; Taylor, T.S.; Watkins, J.G.; West, W.P.

doi:10.1016/s0022-3115(06)80038-3

Cited by 83 publications

(26 citation statements)

References 9 publications

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“…. Similar percentage decreases in oxygen radiation and improvements in important operating parameters were observed in TdeV after boronization using the _-STB technique [10], and in other tokamaks with different internal geometries, operating procedures, and vacuum wall conditions after boronization using the PCVD technique : [3][4][5][6][7][8].…”

Section: Probe-1 Resultsmentioning

confidence: 61%

“…In general, the results indicated the absence of boron on the exposed samples, with the exception of trace amounts found on the midplane A-Sample located directly opposite the target probe. While it is possible to attribute some of the absence of boron on the B-Samples to deposition anistropies, similar to those encountered in the vicinity of electrodes used in boronization with PCVD [6], the absence of boron on the A-Samples, located opposite the probe is most probably due to erosion of the boron and its eventual redeposition on surfaces far from the plasma. In the case of Probe-l, although weight loss measurements are not available, the amount of ablated boron can be estimated using the spectroscopic measurements and Probe-2 results to calibrate the emission rate.…”

Section: Discussionmentioning

confidence: 96%

“…The deposition of thin boron films ("boronization") has been shown to be an effective method for controlling oxygen, carbon, metal, and other deleterious impurities in tokamaks. [3][4][5][6][7][8] Typical boronization methods apply plasma assisted chemical vapor deposition (PCVD) of boron from hazardous borane compounds. [3][4][5][6][7][8] These methods involve several difficult technical, environmental, safety, and health issues.…”

Section: Introductionmentioning

confidence: 99%

“…[3][4][5][6][7][8] Typical boronization methods apply plasma assisted chemical vapor deposition (PCVD) of boron from hazardous borane compounds. [3][4][5][6][7][8] These methods involve several difficult technical, environmental, safety, and health issues. [9] In PBX-M, for example, there are technical constraints on the application of previous boronization techniques which include an unbakeable vessel and a complex interior that includes a closely-fitting electrically isolated passive plate system, RF antennas, coils, cabling, and instrumentation.…”

Section: Introductionmentioning

confidence: 99%

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Initial Boronization of PBX-M Using Ablation from Solid Boronized Probes

et al. 1994

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The initial boronization of PBX-M was performed using the sequential ablation of two types of .solid target probes. Probe-1 in a mushroom shape consisted of a 10.7% boronized 2-D CC composite containing 3.6 g of boron in a B4C binder. Probe-2 in a rectangular shape consisted of an 86% boronized graphite felt composite containing 19.5 g of 40 _. boron particles. After boronization with Probe-l, the loop voltage during g 1 MW neutral beam heated plasmas decreased 27% and volt-sec consumption decreased 20%. Strong peripheral spectral lines from Iow-Z elements decreased by factors of about 5. The central oxygen density decreased 15-20%. The total radiated power during neutral beam injection decreased by 43%. Probe-2 boronization exhibited improved operating conditions similar to Probe-l, but for some parameters, a smaller percentage change occurred due to the residual boron from the previous boronization using Probe-1. The ablation rates of both probes were consistent with front face temperatures at or slightly above the boron melting point. These results confirm the effectiveness of the solid target boronization (STB) technique as a realtime impurity control method for replenishing boron depositions without the use of hazardous borane compounds.

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Section: Probe-1 Resultsmentioning

confidence: 61%

Section: Discussionmentioning

confidence: 96%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Initial Boronization of PBX-M Using Ablation from Solid Boronized Probes

et al. 1994

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“…9 10 Molecular structure of carborane (C 2 B 10 H 12 is a dodecahedron which is formed by B/C atoms with externally attached H atoms to each B/C band. 11 Molecular weight, melting, and flash temperature of carborane are 144.23 g/mol, 298, and 400 C, respectively. Since a carborane is thermally stable up to 600 C, boron contained * Author to whom correspondence should be addressed.…”

Section: Introductionmentioning

confidence: 99%

Studies on Formation of Carborane Film Prepared by Using a Deuterium Glow Discharge Method

Shin

Kim²,

Lee³

et al. 2013

j. nanosci. nanotech.

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Carborane powders (C2B10H12) were deposited on silicon substrates and the physical properties of the films were investigated as functions of the distance of the sample from the electrode, the carborane mass, and the plasma-pulse. To obtain the optimum thickness of the films, three silicon substrates were positioned at 6.5, 16.5, and 36.5 cm from the electrode, and the thickness of the samples was analyzed by using XRD, TEM, and SEM. For the deposition, the carborane powder was warmed to 80 degrees C in 10 minutes and was applied a DC-power pulse of 900 W (150 volts, 6 amps) for 2 hours. The mass of carborane and the on-time sequence were varied during the deposition. The combined results of XRD and TEM studies revealed that the structure of the deposited film is an amorphous phase. A careful analysis of the SEM images show that the thickness of the carborane films increased as increasing the mass of the flown carborane while it remained constant when a plasma-pulse time was varied. The thickest film of 353 A was achieved from the samples placed closest to the carborane inlet and the thickness became thinner as farther from the source suggesting that the density of the evaporated carborane powder in a chamber decreased as increasing the distance of the sample from the carborane inlet.

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Growth of carbon impurity density and adequate divertor wall temperature for fusion experimental reactors

Hino

Yamashina

1994

J Fusion Energ

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Boronization in DIII-D

Cited by 83 publications

References 9 publications

Initial Boronization of PBX-M Using Ablation from Solid Boronized Probes

Initial Boronization of PBX-M Using Ablation from Solid Boronized Probes

Studies on Formation of Carborane Film Prepared by Using a Deuterium Glow Discharge Method

Growth of carbon impurity density and adequate divertor wall temperature for fusion experimental reactors

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