Breaking the elastic limit of piezoelectric ceramics using nanostructures: A case study using ZnO

Kim, Hoon; Yun, Seokjung; Kim, Ki-Sun; Kim, Wonsik; Ryu, Jeongjae; Nam, Hyeon Gyun; Han, Seung Min; Jeon, Seungwon; Hong, Seungbum

doi:10.1016/j.nanoen.2020.105259

Cited by 29 publications

(21 citation statements)

References 74 publications

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“…Recently, Kim et al demonstrated the potential application of nanoarchitected materials as piezoelectric materials to develop highly deformable piezoelectric ZnO (Figure 6a). 48 The nanoarchitected ZnO shows a highly enhanced elastic strain limit (∼0.030), 10 times higher than that of bulk ZnO (∼0.003), maintaining a considerable d 33 value. The overall fabrication process and unit-cell geometry of nanoarchitected ZnO are similar to those for the aforementioned BCT Al 2 O 3 using PnP and ALD.…”

Section: Nanoarchitected Materials Fabricated By Pnpmentioning

confidence: 96%

“…ALD, an advanced version of chemical vapor deposition (CVD), achieves excellent step coverage and precise thickness control at the atomic level on complex 3D nanostructures due to a self-limiting reaction that sequentially separates the two reactants (Figure e) . A variety of oxide materials such as Al 2 O 3 , TiO 2 , ZnO, , and TiN desired for specific applications have been conformally deposited on 3D templates, and their superior properties have been proven. In this review, we concentrate on the superiority of thin-shell oxide nanoarchitected materials exhibiting unconventional mechanical properties.…”

Section: Nanoarchitected Materials Fabricated By Pnpmentioning

confidence: 99%

Section: Nanoarchitected Materials Fabricated By Pnpmentioning

confidence: 99%

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Scalable Fabrication of High-Performance Thin-Shell Oxide Nanoarchitected Materials via Proximity-Field Nanopatterning

2021

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Nanoarchitected materials are considered as a promising research field, deriving distinctive mechanical properties by combining nanomechanical size effects with conventional structural engineering. Despite the successful demonstration of the superiority and feasibility of nanoarchitected materials, scalable and facile fabrication techniques capable of macroscopically producing such materials at a low cost are required to take advantage of the nanoarchitected materials for specific applications. Unlike conventional techniques, proximity-field nanopatterning (PnP) is capable of simultaneously obtaining high spatial resolution and mass producibility in synthesizing such nanoarchitected materials in the form of an inch-scale film. Herein, we focus on the feasibility of using PnP as a scalable fabrication technique for three-dimensional nanostructures and the superiority of the resultant thin-shell oxide nanoarchitected materials for specific applications, such as lightweight structural materials, mechanically robust nanocomposites, and high-performance piezoelectric materials. This review will discuss and summarize the relevant results obtained for nanoarchitected materials synthesized by PnP and provide suggestions for future research directions for scalable manufacturing and application.

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Section: Nanoarchitected Materials Fabricated By Pnpmentioning

confidence: 96%

Section: Nanoarchitected Materials Fabricated By Pnpmentioning

confidence: 99%

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Scalable Fabrication of High-Performance Thin-Shell Oxide Nanoarchitected Materials via Proximity-Field Nanopatterning

2021

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“…The zoomed-in image of the single unit cell is exhibited in the bottom of Figure 8b. Another group [73] reported a truss-like 3D hollow ZnO nanostructure using PnP method that exhibits a drastically improved elastic strain limit while maintaining a piezoelectric coefficient similar to that of single crystal ZnO, showing excellent potential application in enhanced haptic devices, flexible sensors, and energy harvesters. The SEM images of 3D ZnO hollow nanostructures after removal of the epoxy template are displayed in Figure 8c.…”

Section: Resist Polymer Templatesmentioning

confidence: 99%

Atomic Layer Assembly Based on Sacrificial Templates for 3D Nanofabrication

Geng

Zhang

et al. 2022

Micromachines

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Three-dimensional (3D) nanostructures have attracted widespread attention in physics, chemistry, engineering sciences, and biology devices due to excellent functionalities which planar nanostructures cannot achieve. However, the fabrication of 3D nanostructures is still challenging at present. Reliable fabrication, improved controllability, and multifunction integration are desired for further applications in commercial devices. In this review, a powerful fabrication method to realize 3D nanostructures is introduced and reviewed thoroughly, which is based on atomic layer deposition assisted 3D assembly through various sacrificial templates. The aim of this review is to provide a comprehensive overview of 3D nanofabrication based on atomic layer assembly (ALA) in multifarious sacrificial templates for 3D nanostructures and to present recent advancements, with the ultimate aim to further unlock more potential of this method for nanodevice applications.

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“…Through the development of micro-/nanotechnologies, it has been proven that nano-physicochemical properties (including the stretchability and thermoelectric and photocatalytic properties) originating from various classes of 3D nanostructures can be successfully extended to bulk properties through an inch-scale production of the pattern [40,53,65,[83][84][85][86][87]. A wide range of high-value-added applications such as energy storage systems [60,[88][89][90][91][92][93][94], optical films [95], structural materials [96][97][98][99][100], and sensory devices [39,58,[101][102][103] have since become possible to implement through a wafer-scale production. It should be mentioned that the material substitution from a 3D polymeric template into ceramic, metal, and organic functional materials through atomic layer deposition [84-87, 89, 91, 95, 98], electroplating [60,83,88,93], and infiltration [40,53], respectively, can be used to expand the technical functionality during this 3D nanofabrication process.…”

Section: Realization Of Large-area 3d Nanopatternsmentioning

confidence: 99%

Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication

et al. 2021

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Three-dimensional (3D) nanoarchitectures have offered unprecedented material performances in diverse applications like energy storages, catalysts, electronic, mechanical, and photonic devices. These outstanding performances are attributed to unusual material properties at the nanoscale, enormous surface areas, a geometrical uniqueness, and comparable feature sizes with optical wavelengths. For the practical use of the unusual nanoscale properties, there have been developments for macroscale fabrications of the 3D nanoarchitectures with process areas over centimeter scales. Among the many fabrication methods for 3D structures at the nanoscale, proximity-field nanopatterning (PnP) is one of the promising techniques that generates 3D optical holographic images and transforms them into material structures through a lithographic process. Using conformal and transparent phase masks as a key factor, the PnP process has advantages in terms of stability, uniformity, and reproducibility for 3D nanostructures with periods from 300 nm to several micrometers. Other merits of realizing precise 3D features with sub-100 nm and rapid processes are attributed to the interference of coherent light diffracted by phase masks. In this review, to report the overall progress of PnP from 2003, we present a comprehensive understanding of PnP, including its brief history, the fundamental principles, symmetry control of 3D nanoarchitectures, material issues for the phase masks, and the process area expansion to the wafer-scale for the target applications. Finally, technical challenges and prospects are discussed for further development and practical applications of the PnP technique.

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Breaking the elastic limit of piezoelectric ceramics using nanostructures: A case study using ZnO

Cited by 29 publications

References 74 publications

Scalable Fabrication of High-Performance Thin-Shell Oxide Nanoarchitected Materials via Proximity-Field Nanopatterning

Scalable Fabrication of High-Performance Thin-Shell Oxide Nanoarchitected Materials via Proximity-Field Nanopatterning

Atomic Layer Assembly Based on Sacrificial Templates for 3D Nanofabrication

Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication

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