Bringing mask repair to the next level

Edinger, Klaus; Wolff, Klaus‐Dietrich; Steigerwald, H.; Auth, N.; Spies, Petra; Oster, Jens; Schneider, H.; Budach, Michael; Hofmann, Thorsten; Waiblinger, M.

doi:10.1117/12.2072474

Cited by 5 publications

(4 citation statements)

References 4 publications

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“…Surface diffusion (2), thermally induced desorption (3') and electron-stimulated desorption (3) take place. Within the focus of the electron beam, adsorbed precursor molecules are dissociated followed by desorption of volatile organic ligands (4). Upper right: For pattern definition the electron beam is moved in a raster fashion (here: serpentine) over the surface and settles on each dwell point for a specified dwell time t D .…”

Section: Basics Of Focused Electron Beam Induced Depositionmentioning

confidence: 99%

“…last decade FEBID or, more generally, focused electron beam induced processing (FEBIP) has developed from a rather exotic technique employed by a small number of specialist groups for a rather limited but important selection of applications, such as mask repair [4], into a highly versatile technology for various materials research areas. These comprise amorphous and polycrystalline superconductors [5,6,7], magnetic materials [8], alloys and intermetallic compounds [9,10,11,12,13,14,15], multilayer structures [15,16] and metamaterials in which suitable materials combinations result in a desired functionality [17,8].…”

mentioning

confidence: 99%

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Focused electron beam induced deposition meets materials science

Huth

Porrati

Dobrovolskiy

2018

Microelectronic Engineering

157

172

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simulation-assisted growth of complex three-dimensional nano-architectures is also covered. In the review particular emphasis is laid on conceptual clarity in the description of the different developments, which is reflected in the mostly schematic nature of the presented figures, as well as in the recurring final sub-sections for each of the main topics discussing the respective "challenges and perspectives".

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Section: Basics Of Focused Electron Beam Induced Depositionmentioning

confidence: 99%

mentioning

confidence: 99%

Focused electron beam induced deposition meets materials science

Huth

Porrati

Dobrovolskiy

2018

Microelectronic Engineering

157

172

View full text Add to dashboard Cite

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“…Thanks to the small beam diameters of modern microscopes, the lateral resolution of FEBI deposits reaches the nanometer range. − FEBID has proven to become a very versatile technique for the direct-write deposition of a large variety of materials including alloys − and magnetic materials . It furthermore finds application in many different fields such as industrial mask repair, − sensors, − scanning probe tips, − or nanophotonics and nanoplasmonics. − …”

Section: Introductionmentioning

confidence: 99%

High-Purity Copper Structures from a Perfluorinated Copper Carboxylate Using Focused Electron Beam Induced Deposition and Post-Purification

Berger

Jurczyk

Madajska

et al. 2020

ACS Appl. Electron. Mater.

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The electron-induced modification of volatile physisorbed metal–organic molecules is the key process in focused electron beam induced deposition (FEBID). In this work, the perfluorinated copper carboxylate [Cu2(μ-O2CC2F5)4], (Cu2(pfp)4), was implemented in FEBID, as it has the highest metal-to-carbon ratio Cu/C = 1:6 compared to other Cu precursors used so far. FEBID was obtained within a small temperature window of 120–130 °C. Transmission electron microscopy verified the presence of metal(oxide) nanocrystals within a carbonaceous matrix. The chemical composition analysis revealed the loss of about 80% of ligand material during the electron-induced dissociation. The copper nanocrystals oxidized within a few minutes in films <80 nm upon exposure to ambient conditions, while they were protected by a carbon–fluorine-containing matrix in thicker areas of the deposits. A two-step post-growth annealing procedure with subsequent oxidizing and reducing atmosphere was used to purify the deposits. Pure copper crystals were formed in this step.

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“…FEBID serves numerous application fields since it can be used on any kind of substrate, is capable of sub-10 nm resolution, and a wide range of materials can be deposited with high flexibility in pattern design, even in 3D [57,58]. In particular, FEBID is used in mask repair [59,60], plasmonics [61,62], nano-magnetism [58,63], superconductivity [64,65] and strain sensing [66][67][68]. The main advantage of FEBID as compared to conventional lithographic techniques is that, being a direct-write technique, intermediate steps such as resistcoating, developing, metal deposition and lift-off are not necessary.…”

Section: Introductionmentioning

confidence: 99%

Direct-write single electron transistors by focused electron beam induced deposition

et al. 2019

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Single-electron transistor (SET) device fabrication for operation in the tens of Kelvin range is still challenging due to the need of controlled definition of the metallic island with a diameter far below 100 nm and proper tuning of the island’s tunnel couplings to the drain and source leads. Here we present results on SET device fabrication using focused electron beam induced deposition (FEBID) for island definition between pre-fabricated SET electrode structures. The island’s nano-granular microstructure allows us, in conjunction with in situ tuning of the inter-grain tunnel coupling by post-growth electron irradiation, to study the effect of the island’s electronic granularity on SET device performance. In addition we show that for reliable SET operation FEBID-associated co-deposit in proximity of the island has to be removed which can be accomplished by a novel in situ Ar ion etching process. For the low-temperature properties of functioning SET devices we obtain good agreement of capacitance values deduced from the current–voltage characteristics and capacitance calculations based on the geometry of the device electrodes and the microstructure of the island. Complementary simulations of the SET current–voltage characteristics based on the master equation approach are in good agreement with the experimental data. The observation of well-defined Coulomb oscillations indicates that FEBID-based SET structures can be useful as on-demand charge monitor devices with high lateral positioning flexibility.

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Bringing mask repair to the next level

Cited by 5 publications

References 4 publications

Focused electron beam induced deposition meets materials science

Focused electron beam induced deposition meets materials science

High-Purity Copper Structures from a Perfluorinated Copper Carboxylate Using Focused Electron Beam Induced Deposition and Post-Purification

Direct-write single electron transistors by focused electron beam induced deposition

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