2019
DOI: 10.1002/pssa.201900764
|View full text |Cite
|
Sign up to set email alerts
|

Broadband Ultraviolet Emission from 2D Arrays of AlGaN Microstructures Grown on the Patterned AlN Templates

Abstract: Broadband ultraviolet (UV) emission is achieved using AlGaN microstructure 2D arrays. 2D arrays of trenches are initially formed on AlN templates on sapphire (0001) substrates. AlGaN‐based quantum wells (QWs) are subsequently regrown on top of the patterned templates. Bunched steps are formed within the trench, inducing variations in the Al composition and AlGaN thickness in the QWs. Regions with and without bunched steps coexist and cause emission wavelength variations. The formation mechanism of bunched step… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2021
2021
2021
2021

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 20 publications
0
1
0
Order By: Relevance
“…A chamfer angle of 4 • has also been reported to inhibit the growth of irregular grains at the interface [30]. When the substrate is arranged into a periodic concave-convex pattern, it can effectively inhibit the development of dislocations during the epitaxial growth process and annihilate them in the early stage of formation [31][32][33]. For instance, the group of Wang Junxi of the Institute of Semiconductors of the Chinese Academy of Sciences grew an AlN buffer layer on a patterned sapphire substrate, which enabled reducing the thickness of the buffer layer and improved the IQE of the UVC LED [34].…”
Section: Immature Epitaxial Technology Of Highmentioning
confidence: 99%
“…A chamfer angle of 4 • has also been reported to inhibit the growth of irregular grains at the interface [30]. When the substrate is arranged into a periodic concave-convex pattern, it can effectively inhibit the development of dislocations during the epitaxial growth process and annihilate them in the early stage of formation [31][32][33]. For instance, the group of Wang Junxi of the Institute of Semiconductors of the Chinese Academy of Sciences grew an AlN buffer layer on a patterned sapphire substrate, which enabled reducing the thickness of the buffer layer and improved the IQE of the UVC LED [34].…”
Section: Immature Epitaxial Technology Of Highmentioning
confidence: 99%