1993
DOI: 10.1063/1.44919
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Cadmium telluride thin-film solar cells by pulsed-laser deposition

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Cited by 4 publications
(5 citation statements)
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“…Particularly, the PLD method permits to control and change the CdS/CdTe layer intermixing, as well as layer structure and grain size [9,10]. Compaan et al [11,12] fabricated polycrystalline CdS/CdTe solar cells on glass substrates by PLD method. The studies show that properly preparing of targets in this method leads to CdTe/CdS mixed interfaces as well as to doping of the structure in a simple way.…”
Section: Introductionmentioning
confidence: 99%
“…Particularly, the PLD method permits to control and change the CdS/CdTe layer intermixing, as well as layer structure and grain size [9,10]. Compaan et al [11,12] fabricated polycrystalline CdS/CdTe solar cells on glass substrates by PLD method. The studies show that properly preparing of targets in this method leads to CdTe/CdS mixed interfaces as well as to doping of the structure in a simple way.…”
Section: Introductionmentioning
confidence: 99%
“…However, the reports are mainly focused on physical properties of the films as evaluated by scanning electron microscopy, atomic force microscopy, UV-Vis and X-ray diffraction [24,25]. PLD-based solar cells with efficiencies from 3% to 10.5% have also been reported [16][17][18][19][20][21]. In this paper, in-situ deposited CdTe/CdS films are analyzed with a special emphasis on their electrical properties using current-voltage…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…[3,14,18,21]. To complete the devices, 200 nm of gold on 3 nm of copper contacts [16] were deposited by e-beam deposition and an annealing process at 150C in a N 2 atmosphere for 30 minutes was carried out after contact deposition. The resulting devices were analyzed electrically studied using I-V and C-V measurements.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
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“…CdS films can be deposited by a wide range of techniques, such as vacuum evaporation [4], atomic layer epitaxy [5], spray pyrolysis [6], close space sublimation [7], radio frequency sputtering and LASER physical vapour deposition [8], chemical bath deposition [9], electrochemical deposition [10], etc. Recently, the galvanic technique (a second electrochemical process) has been used by us to deposit CdS thin films [11,12].…”
mentioning
confidence: 99%