Calculation and interpretation of the continuum radiation of hydrogen molecules

Fantz, U.; Schalk, B.; Behringer, K.

doi:10.1088/1367-2630/2/1/007

Cited by 42 publications

(41 citation statements)

References 19 publications

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“…b 3 R u ? ) from 200 to 600 nm [20]. We note that under the conditions of present experiment we could not observe the C 2 emission which is sometimes observed in other types of methane plasmas [21].…”

Section: Resultscontrasting

confidence: 60%

Time Resolved Spectroscopic Characterization of a-C:H Deposition by Methane and Removal by Oxygen Inductively Coupled RF Plasma

Bišćan

Kregar

Krstulović

et al. 2010

Plasma Chem Plasma Process

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The deposition of amorphous hydrogenated carbon thin films by inductively coupled radio frequency (IC RF) pure methane plasma and its subsequent removal by IC RF pure oxygen plasma have been studied within a cylindrical glass tube. Both processes were simultaneously monitored by optical emission spectroscopy, light transmission through thin film deposits, temperature of the discharge tube and total gas pressure measurements. Comparing the time evolution of all parameters, various stages of oxygen plasma cleaning process were established. The transitions between E-mode and H-mode of plasma induced by the presence of cleaning products impurities were observed and discussed.

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Section: Resultscontrasting

confidence: 60%

Time Resolved Spectroscopic Characterization of a-C:H Deposition by Methane and Removal by Oxygen Inductively Coupled RF Plasma

Bišćan

Kregar

Krstulović

et al. 2010

Plasma Chem Plasma Process

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“…The simulation of the continuum emission implies the consideration of a repulsive state and thus wavelength dependent transition probabilities assigned to the ro-vibrational quantum number of the upper state. Simulation of the continuum emission is applied successfully at low temperature plasmas for plasma diagnostic purposes; in particular, it has been shown that the vibrational population determines the shape of the continuum emission, whereas the intensity is sensitive to the electron density and temperature [29,30]. Figure 4 shows the spectrum of a hydrogen plasma at a pressure of 3 Pa measured with the VUV spectrometer.…”

Section: Simulation Of Molecular Spectra Using a Corona Modelmentioning

confidence: 99%

“…The continuum radiation of the a -b transition covers the wavelength region from 120 -600 nm. The continuum spectrum is strongly overlapped for wavelengths lower than 190 nm by the continuum emitted from the Lyman band [30] which is dominated by the transition of the v' = 9 level of the B 1  u + state into the dissociation limit of the ground state. Above 280 nm the signal-to-noise ratio of the measured spectrum becomes too small for a reliable analysis.…”

Section: Example Spectra and Wavelength Rangesmentioning

confidence: 99%

Quantification of the VUV radiation in low pressure hydrogen and nitrogen plasmas

Fantz

Briefi

Rauner

et al. 2016

Plasma Sources Sci. Technol.

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Abstract. Hydrogen and nitrogen containing discharges emit intense radiation in a broad wavelength region in the VUV. The measured radiant power of individual molecular transitions and atomic lines between 117 nm and 280 nm are compared to those obtained in the visible spectral range and moreover to the RF power supplied to the ICP discharge. In hydrogen plasmas driven at 540 W of RF power up to 110 W are radiated in the VUV, whereas less than 2 W is emitted in the VIS. In nitrogen plasmas the power level of about 25 W is emitted both in the VUV and in the VIS. In hydrogen-nitrogen mixtures, the NH radiation increases the VUV amount. The analysis of molecular and atomic hydrogen emission supported by a collisional radiative model allowed determining plasma parameters and particle densities and thus particle fluxes. A comparison of the fluxes showed that the photon fluxes determined from the measured emission are similar to the ion fluxes, whereas the atomic hydrogen fluxes are by far dominant. Photon fluxes up to 510 20 m -2 s -1 are obtained, demonstrating that the VUV radiation should not be neglected in surface modifications processes, whereas the radiant power converted to VUV photons is to be considered in power balances. Varying the admixture of nitrogen to hydrogen offers a possibility to tune photon fluxes in the respective wavelength intervals.

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“…One of the dominant species in molecular plasmas is the hydrogen molecule which is either a background gas of the discharge or formed by electron impact dissociation of a parent molecule such as CH 4 . One of the most intense transitions in molecular hydrogen is the Fulcher transition (d…”

Section: Applications To Plasmas Containing Hydrogenmentioning

confidence: 99%

Emission Spectroscopy of Molecular Low Pressure Plasmas

Fantz

2004

Contrib. Plasma Phys.

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The diagnostic tool of optical emission spectroscopy with applications to molecular low pressure plasmas is introduced and the underlying principles for the analysis of molecular radiation are summarized. Results for rotational, vibrational and electronic population densities in electronically excited states and in the ground state of diatomic molecules such as hydrogen and nitrogen are shown. Besides molecular densities atomic densities are obtained and the relevance of opacity of resonance lines in the analysis is discussed. In more complex plasmas such as hydrocarbon plasmas, the radiation of radicals is used to determine particle densities. Here, the contribution of the dissociative excitation mechanism has to be taken into account. A simple monitoring tool for the determination of particle density ratios is emphasized based on the measurement of intensity ratios. Results are presented for plasma applications with volume processes as well as with plasma surface interaction.

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Calculation and interpretation of the continuum radiation of hydrogen molecules

Cited by 42 publications

References 19 publications

Time Resolved Spectroscopic Characterization of a-C:H Deposition by Methane and Removal by Oxygen Inductively Coupled RF Plasma

Time Resolved Spectroscopic Characterization of a-C:H Deposition by Methane and Removal by Oxygen Inductively Coupled RF Plasma

Quantification of the VUV radiation in low pressure hydrogen and nitrogen plasmas

Emission Spectroscopy of Molecular Low Pressure Plasmas

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