Calculation of Maximum Sharpness of Separation When Holdup Is Appreciable

Rose, Arthur; Welshans, L.; Long, Harry H.

doi:10.1021/ie50365a018

Cited by 18 publications

(16 citation statements)

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“…Furthermore, if the individual steps of a discontinuous process are decreased in size and increased in number, then the mathematical distribution expression and the experimentally observed distribution approach the form of those in a con- tinuous process (12)(13)(14). There are other chemical separations, such as distillation (15,16) or chromatography (17)(18)(19) which are normally conducted in a continuous manner, but for which the distribution mathematics can be successfully treated in terms of a hypothetical discontinuous process. In addition to the above, the various processes have received extensive treatment (20)(21)(22)(23) in terms of their kinetics and mechanisms.…”

Section: Discussionmentioning

confidence: 99%

Epitaxial Silicon Junctions

Kahng¹,

Thomas²,

Manz³

1963

J. Electrochem. Soc.

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In a preceding paper, the effect of the epitaxial silicon growth process on impurity distribution in the epitaxial film was treated in terms of a countercurrent model, and experimental results were presented for n-type films on n-type substrates. In the present paper, additional experimental data are presented for p-on-p, n-on-p, and p-on-n growth conditions.For n-on-p, or p-on-n growth, the electrical junctions are shifted by the process a distance of xj microns (the junction lag) from the substrate-film interface. The process-dominated junction lag may be much larger than that predicted from diffusion considerations. It is dependent on the film growth temerature and the doping levels in the substrate and in the gas phase. As predicted by the countercurrent distribution expression, it is greater for lower growth temperatures.Junction lags from immeasurably small values up to greater than 30~ have been generated. There is quantitative agreement between the observed magnitude of the junction lag and the value predicted by use of the countercurrent distribution expression. Also, for those samples measured electrically (with junction lags of 1.8-4.8~) the agreement between the measured mean impurity concentration level (by four-point probe measurements) in the epitaxial layer and the mean impurity level predicted on the basis of the distribution expression is quantitative.

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Section: Discussionmentioning

confidence: 99%

Epitaxial Silicon Junctions

Kahng¹,

Thomas²,

Manz³

1963

J. Electrochem. Soc.

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“…The reflux ratio as determined by overhead measurements is equal to the over-all reflux ratio only when the column is truly adiabatic. The importance of using an adequate reflux ratio, in conjunction with an adequate number of plates, for a desired separation, is well brought out by Rose (13).…”

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confidence: 99%

Apparatus and Methods for Precise Fractional-Distillation Analysis: New Design of Adiabatic Fractioning Column and Precision-Spaced Wire Packing for Temperature Range- 190* to 300* C.

Podbielniak¹

1941

Ind. Eng. Chem. Anal. Ed.

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“…Accuracy of the reflux ratios provided by the two types of still heads and the variation of reflux ratio with overhead rate. 8. Condensation in the column due to heat loss through the Dewar jacket and variation of heat loss from column to column.…”

Section: Criteria and Test Methodsmentioning

confidence: 99%

Evaluation of Laboratory Distillation Apparatus. Improved Oldershaw Glass Bubble Plate Columns, Automatic Still Heads and Accessories

Collins¹,

Lantz²

1946

Ind. Eng. Chem. Anal. Ed.

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Novel test methods have been developed for evaluating laboratory distillation apparatus under conditions approximating actual operation rather than under ideal conditions for maximum separation. In particular, the effect of reflux ratio on efficiency and separation has been studied. Test methods for evaluating the other principal characteristics of distillation apparatus are also described in detail. The Oldershaw glass bubble plate column has heen improved and studied, using the test methods described. The eolumn has been found highly satisfactory for analytical distillaticns of hydrocarbon mixtures because of uniformity of its operating characteristics. Automatic still heads and other accessory equipment have been developed which contribute to the uniformity of the performance of the column.NALYTICAL distillations are of increasirg importance as a

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Calculation of Maximum Sharpness of Separation When Holdup Is Appreciable

Cited by 18 publications

References 0 publications

Epitaxial Silicon Junctions

Epitaxial Silicon Junctions

Apparatus and Methods for Precise Fractional-Distillation Analysis: New Design of Adiabatic Fractioning Column and Precision-Spaced Wire Packing for Temperature Range- 190* to 300* C.

Evaluation of Laboratory Distillation Apparatus. Improved Oldershaw Glass Bubble Plate Columns, Automatic Still Heads and Accessories

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