2016
DOI: 10.1016/j.jcrysgro.2016.08.050
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Calculation of strain compensation thickness for III–V semiconductor quantum dot superlattices

Abstract: Models based on continuum elasticity theory are discussed to calculate the necessary thickness of a strain compensation (SC) layer for a superlattice (SL) of strained quantum wells (QW) or quantum dots (QD). These models are then expanded to cover material systems (substrates, QW or QD, and SC) composed of AlP, AlAs, AlSb, GaP, GaAs, GaSb, InP, InAs, or InSb, as well as the ternary, quaternary, and higher order material alloys possible in the Al/Ga/In/P/As/Sb systems. SC thickness calculation methods were comp… Show more

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Cited by 17 publications
(8 citation statements)
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“…The detailed description of substrate treatment and the GaSb buffer layer deposition procedure can be found elsewhere [14], [15]. The LWIR range was reached by growing 9.99 nm period "Ga-free" T2SLs (InAs 7.58 nm/InAsSb 2.41 nm, x Sb = 0.38), where the layer thicknesses were simulated according to the approach given by Polly et al [16].…”
Section: Sample Preparation and Device Structurementioning
confidence: 99%
“…The detailed description of substrate treatment and the GaSb buffer layer deposition procedure can be found elsewhere [14], [15]. The LWIR range was reached by growing 9.99 nm period "Ga-free" T2SLs (InAs 7.58 nm/InAsSb 2.41 nm, x Sb = 0.38), where the layer thicknesses were simulated according to the approach given by Polly et al [16].…”
Section: Sample Preparation and Device Structurementioning
confidence: 99%
“…Here 𝐶 12 𝑆𝐿 and 𝐶 11 𝑆𝐿 are the weighted averages of the elastic constants of the individual unstrained CdTe and ZnCdSe layers given by 18 :…”
Section: Growthmentioning
confidence: 99%
“…The SBQW region is inserted into the junction depletion region, surrounded on both sides by intrinsic layers of GaAs without intentional doping. The In x Ga 1-x As quantum wells are also undoped and strain balanced with GaAs 0.90 P 0.10 barrier layers [18], [19]. Thin 1 nm GaAs transition layers are inserted at each As-P interface in the well region.…”
Section: Device Structures and Experimental Detailsmentioning
confidence: 99%