Calculation of the extreme-ultraviolet radiation conversion efficiency for a laser-produced tin plasma source

Simulation of Extreme Ultraviolet Radiation and Conversion Efficiency of Lithium Plasma in a Wide Range of Plasma Situations

“…At the same time, this paper also hopes to realize whether lithium plasma has a limit to its EVUCE and what this limit is. Therefore, the radiation spectrum of lithium plasma is simulated over a temperature range of 5 to 200 eV and a density range of 0.534 g/cm 3 to 0.00000534 g/cm 3 , which covers from solid density (N = 4.63 × 10 22 cm −3 ) to gas density (N = 4.63 × 10 17 cm −3 ) and is the plasma region of interest in the study of EUV light sources. It should be noticed that the plasma density extends to a relative lower value of 4.63 × 10 17 cm −3 , at which the assumption of the Saha equation probably does not hold well.…”

“…For example, a sustained time of 10 ns for plasma at a density of ρ = 0.53 g/cm 3 can reach a maximum EUVCE value of up to 27.96%. But for a plasma at a density of ρ = 0.0000053 g/cm 3 , the maximum EUVCE value is only about 2.1% for the same sustained time of 10 ns. This means that for low-density plasmas, a longer sustained time is needed to reach the same EUVCE as a higher-density plasma.…”

“…Currently, the generation of intense EUV light for commercial applications mainly relies on plasma radiation. Therefore, laser-and discharge-produced plasmas (LPPs and DPPs, respectively) have become the two mainstream technologies for the development of EUV light sources [2,3]. ASML [4], one of the rare suppliers of EUV lithography machines in the world, adopts the LPP solution.…”

Metrology and Measurement Systems

“…This increases the target density in the laser-gas interaction region. There is a significant interest in maximizing output from laser-produced plasmas in different wavelength ranges meant for specific applications [24][25][26]. In the present work, wideband spectral emission measurements from such a laser-produced plasma source based on double stream gas puff target are reported.…”

Review of the 1st EUV Light Sources Code Comparison Workshop

“…Examples include the elucidation of EUV generation in laser-driven tin plasmas [17][18][19][20][21][22][23], the characterization of tin-plasma properties [24][25][26][27][28][29][30] as well as the identification of experimental conditions (laser parameters, tin target structures, etc.) that optimize the working conditions of the light source [31][32][33][34][35][36]. Looking to the future and the need to develop more powerful EUV sources (beyond the current 250 W of in-band EUV power [37]) will require (i) new, fundamental insights on EUV generation from complex target structures [34] and (ii) exploring the plasma physics implications of alternate drive-laser concepts, e.g., the use of a Thulium-based 2-µm-wavelength drive laser [38][39][40][41][42].…”