Candidate oxidation resistant coatings via combustion chemical vapor deposition

Combustion chemical vapour deposition of Al2O3 films: Effect of temperature on structure, morphology and adhesion

“…Alumina in its stable corundum phase (α-alumina) is an important oxide material with attractive properties such as chemical inertness [1], high hardness [2], high melting point, resistance to thermal sock [3], high electrical and oxidation resistance [4]. Apart from the stable corundum phase, it has a number of meta-stable polymorphs like γ-, η-, δ-, θ-, κ-and χ-alumina [5].…”

“…Several groups have reported synthesis of alumina coating using C-CVD [13][14][15][16][17][18][19][20]. Among these Hunt et al [13], Hwang et al [16], Hampikian et al [18], Shanmugham et al [19] and Bahlawane [20] have used a neumatic atomizer, and Stollberg et al [15] and Carter et al [17] used an oscillatory capillary nebulizer to generate precursor aerosols.…”

“…Among these Hunt et al [13], Hwang et al [16], Hampikian et al [18], Shanmugham et al [19] and Bahlawane [20] have used a neumatic atomizer, and Stollberg et al [15] and Carter et al [17] used an oscillatory capillary nebulizer to generate precursor aerosols. All of them have used an extra pilot flame to prevent the precursor flame blow off.…”

“…The C-CVD facility was made by coupling the custom made premixed-diffusion type burner with the ultrasonic nebulizer. Though there are reports on synthesis of alumina coatings at high temperatures (1000 to 1250°C) [13,[15][16][17][18][19][20] using C-CVD, reports on synthesis in the low temperature regime (500 to 1000) as well film adhesion strength are scarce. Hence this work was carried out to study the variation of structure, morphology and adhesion of films with deposition temperature below 1000°C.…”

High Speed Deposition of Y<SUB>2</SUB>O<SUB>3</SUB> Films by Laser-Assisted Chemical Vapor Deposition

“…[1][2][3][4][5]7,8) As-deposited films produced by electron beam evaporation were mainly amorphous and only transformed into crystalline phase upon annealing at moderate temperature. On the other hand, conventional CVD process has produced films with very low deposition rates in the range of around several mm/h, and therefore obtaining films with the desired thickness need a significantly long deposition time.…”