2009
DOI: 10.1088/0957-0233/21/2/025502
|View full text |Cite
|
Sign up to set email alerts
|

Cantilever contribution to the total electrostatic force measured with the atomic force microscope

Abstract: The atomic force microscope (AFM) is a powerful tool for surface imaging at the nanometer scale and surface force measurements in the piconewton range. Among long-range surface forces, the electrostatic forces play a predominant role. They originate if the electric potentials of the substrate and of the tip of the AFM cantilever are different. A quantitative interpretation of the AFM signal is often difficult because it depends in a complicated fashion on the cantilever-tip-surface geometry. Since the electros… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
15
0

Year Published

2012
2012
2024
2024

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 27 publications
(15 citation statements)
references
References 42 publications
0
15
0
Order By: Relevance
“…Understanding the electric field effect in nanostructured thin films is a key issue in nanoscience nowadays. 1 By applying a voltage between a force microscope tip and a sample, electrostatic force microscopy (EFM) [2][3][4][5][6][7][8] has been used to analyze different properties of thin films at the nanoscale. 9 Recently, single and few layer graphene (FLG) 10 have attracted much attention because of its atypical response to electrostatic fields, which is in sharp contrast with that expected for conventional conducting or semiconducting films.…”
mentioning
confidence: 99%
“…Understanding the electric field effect in nanostructured thin films is a key issue in nanoscience nowadays. 1 By applying a voltage between a force microscope tip and a sample, electrostatic force microscopy (EFM) [2][3][4][5][6][7][8] has been used to analyze different properties of thin films at the nanoscale. 9 Recently, single and few layer graphene (FLG) 10 have attracted much attention because of its atypical response to electrostatic fields, which is in sharp contrast with that expected for conventional conducting or semiconducting films.…”
mentioning
confidence: 99%
“…In contrast to the increase in adhesion at the tip–sample interface upon the application of an out‐of‐plane bias, no significant change in adhesion is observed under an in‐plane potential gradient (Figure S7, Supporting Information), implying that the induced interaction due to the potential gradient contributes little to the attractive intermolecular interaction. The electrostatic interaction between the array of electrodes and the cantilever can be amplified and estimated as Fcant = ε0V22WcantLcantHnormalcantnormalcosβ2 where ε 0 is the vacuum dielectric constant, V is the potential difference between the electrodes and the cantilever, W cant and L cant are the width and length of the cantilever beam, H cant is the height of the tip, and β is the inclination angle of the cantilever. Here, ε 0 = 8.85 × 10 −12 Fm −1 , W cant = 25 × 10 −6 m, L cant = 225 × 10 −6 m, H = 14 × 10 −6 m, β = 16°.…”
Section: Resultsmentioning
confidence: 99%
“…This solution is the most adequate for geometries like the one in this paper (see Figure 1) since the cylindrical symmetry around the -axis allows us to easily obtained the specific solution of the electrostatic potential at any region by applying the electrostatic boundary conditions. Equations 3and (4) give the exact values of the coefficients from regions 0 to 2, which are the only parameters that are unknown in (2). The same procedure can be done for any other geometry with the same axial symmetry.…”
Section: Theoretical Modelmentioning
confidence: 99%
“…In recent years, Electrostatic Force Microscopy (EFM) has become a useful tool in quantitative characterization of different properties at the nanoscale [1][2][3][4][5][6]. These technical improvements have been especially relevant in the characterization of thin films [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%