2016
DOI: 10.1016/j.jmr.2016.07.011
|View full text |Cite
|
Sign up to set email alerts
|

Cantilever detected ferromagnetic resonance in thin Fe50Ni50, Co2FeAl0.5Si0.5 and Sr2FeMoO6 films using a double modulation technique

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
3
0

Year Published

2017
2017
2022
2022

Publication Types

Select...
4

Relationship

1
3

Authors

Journals

citations
Cited by 4 publications
(3 citation statements)
references
References 30 publications
0
3
0
Order By: Relevance
“…This mechanism has been verified by the epitaxial growths of a diverse set of materials, including Heusler alloys [169][170][171], FeGe [132], Co 25 Fe 75 [50], double perovskites [167,[171][172][173][174][175][176][177][178][179][180][181][182][183][184], and YIG [48,[113][114][115][116][117][118][119][120][121][122][123][124][125][126][127][128][129][130][131][133][134][135][136]. The deposition conditions for most materials are as follows: (1) sputtering gases: ultrahigh purity argon, plus 0% to 5% oxygen for oxides depending on the reduction-oxidation chemistry of the mat erials; (2) substrate location: off-axis angle 50° < β < 60°, substrate-to-target distance: 3.5″-4″; (3) substrate temper ature: 200°C-850°C depending on the materials; and (4) deposition rates: 5-120 nm h −1 depending on the materials and sputtering power, which is comparable to the deposition rates of...…”
Section: Uhv Off-axis Magnetron Sputteringmentioning
confidence: 78%
See 2 more Smart Citations
“…This mechanism has been verified by the epitaxial growths of a diverse set of materials, including Heusler alloys [169][170][171], FeGe [132], Co 25 Fe 75 [50], double perovskites [167,[171][172][173][174][175][176][177][178][179][180][181][182][183][184], and YIG [48,[113][114][115][116][117][118][119][120][121][122][123][124][125][126][127][128][129][130][131][133][134][135][136]. The deposition conditions for most materials are as follows: (1) sputtering gases: ultrahigh purity argon, plus 0% to 5% oxygen for oxides depending on the reduction-oxidation chemistry of the mat erials; (2) substrate location: off-axis angle 50° < β < 60°, substrate-to-target distance: 3.5″-4″; (3) substrate temper ature: 200°C-850°C depending on the materials; and (4) deposition rates: 5-120 nm h −1 depending on the materials and sputtering power, which is comparable to the deposition rates of...…”
Section: Uhv Off-axis Magnetron Sputteringmentioning
confidence: 78%
“…To simultaneously address the problems of energetic bombardment and off-stoichiometry associated with conventional on-axis and high pressure off-axis sputtering, we developed a new off-axis sputtering technique in the past several years [168]. Using this new technique, we have successfully grown single-crystalline epitaxial films of a broad range of complex materials with a high degree of structural perfection and stoichiometric compositions, including Heusler compounds [169][170][171], B20-phase FeGe [132], Co 25 Fe 75 [50], double perovskites [167,[171][172][173][174][175][176][177][178][179][180][181][182][183][184], and YIG [48,[113][114][115][116][117][118][119][120][121][122][123][124][125][126][127][128][129][130][131][133][134][135][136]. Below we discuss the details of our off...…”
Section: Uhv Off-axis Magnetron Sputteringmentioning
confidence: 99%
See 1 more Smart Citation