Cantilever influence suppression of contactless IC-testing by electric force microscopy

Wittpahl, V.; Behnke, U.; Wand, B.; Mertin, W.

doi:10.1016/s0026-2714(98)00118-8

Cited by 9 publications

(2 citation statements)

References 5 publications

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“…In figure 10 this effect can clearly be seen at high tip-sample distance in the amplitude image, because the change of the capacity gradient between tip and sample is much higher in relation to the lever. The interaction below the tip becomes dominant at smaller distances, while the interaction with the lever remains nearly constant [26] (the scale of the amplitude images have been differently adjusted to enhance the contrast).…”

Section: Electron-beam-induced Potentialsmentioning

confidence: 99%

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A universal scanning-probe-microscope-based hybrid system

Joachimsthaler¹,

Heiderhoff²,

Balk³

2002

Meas. Sci. Technol.

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A modularly equipped scanning probe microscope (SPM)-based hybrid system is developed, expanding application fields and performances of former instruments. The SPM head can easily be incorporated into the analysis chamber of most scanning electron microscopes (SEMs) and both systems can be handled by the electronics within one software simultaneously. Contact and non-contact scanning force microscope (SFM) measurements obtained inside an environmental SEM for the first time demonstrate resolutions of less than 0.2 nm under working conditions.Both probes can be used simultaneously either as actuators or sensors to deliberately modify and analyse sample properties as well as to characterize the probe interactions. This is the essential advantage of hybrid systems, besides the great number of well known complementary analyses which can be performed with each microscope at the same sample area. The use of an electron beam and a SFM tip as two independent electrical actuators and sensors is demonstrated to be exemplary. Interaction of the probes with each other is a new aspect, which is presented and discussed.

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Section: Electron-beam-induced Potentialsmentioning

confidence: 99%

“…In high-vacuum mode such investigations are not possible due to the unstable imaging conditions. The typical cantilever influence can be seen in the line analysis, which can be compensated for by measurements at different heights [26].…”

Section: Electron-beam-induced Potentialsmentioning

confidence: 99%