1996
DOI: 10.1109/16.477615
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Cap thickness effects on Al/sub 0.37/Ga/sub 0.63/As and GaAs diode solar cells

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“…The p/n configuration instead of n/p structure was employed, because in the latter structure, low open-circuit voltages and fill factors could result due to nonlinear shunting. 5) The completed epitaxial wafer was purchased from Sumitomo Electric Industries Ltd.…”
Section: Device Fabrication and Measurementsmentioning
confidence: 99%
“…The p/n configuration instead of n/p structure was employed, because in the latter structure, low open-circuit voltages and fill factors could result due to nonlinear shunting. 5) The completed epitaxial wafer was purchased from Sumitomo Electric Industries Ltd.…”
Section: Device Fabrication and Measurementsmentioning
confidence: 99%