2013
DOI: 10.1016/j.apsusc.2013.02.045
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Capacitive humidity-sensing properties of Zn2SiO4 film grown on silicon nanoporous pillar array

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Cited by 48 publications
(20 citation statements)
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“…To explain the humidity-dependent capacitive characteristics of CMFTO electro-ceramics, the device sensitivity ( S ) has been calculated by using Equation (5) [55]: S=CRHC33C33×100% where C 33 and C RH stands for the capacitances measured at 33% RH and at a certain RH level, respectively. Figure 7 shows that the applied test frequency has a high influence on the sensitivity of humidity sensors.…”
Section: Resultsmentioning
confidence: 99%
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“…To explain the humidity-dependent capacitive characteristics of CMFTO electro-ceramics, the device sensitivity ( S ) has been calculated by using Equation (5) [55]: S=CRHC33C33×100% where C 33 and C RH stands for the capacitances measured at 33% RH and at a certain RH level, respectively. Figure 7 shows that the applied test frequency has a high influence on the sensitivity of humidity sensors.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, to overcome this nonlinearity drawback, an exponential function can be introduced to make the nonlinear response more linear [55]. Therefore, in the present study, a transformed logarithmic capacitive-RH response curve was generated and is depicted in Figure 9.…”
Section: Resultsmentioning
confidence: 99%
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“…To evaluate the humidity dependent capacitive characteristic of the S1050 electroceramic and humidity dependent resistive characteristic of flexible S1050/PDMS nanocomposite film, the device sensitivity (S) is calculated using Equation (5) [55] and Equation (6) [56], respectively. Sensitivity =normalCRHnormalC33normalC33×100% Sensitivity =ΔZΔ%RH where C RH is the capacitance at any measured % RH condition and C 33 is capacitance value at the initial of RH is equal to 33%, Δ% RH is the difference in % RH and ΔZ is the difference in impedance or resistance.…”
Section: Resultsmentioning
confidence: 99%
“…Samples 4, 5, and 6, (obtained at higher working pressures) have peaks at 34.4° (002 -wurzite phase), which are smaller and more extended than those obtained for samples 1, 2, and 3, indicating a more disorganized structure, and therefore, less crystalline. At low pressure, the particles produced a substrate with higher values of energy and can form zinc silicate (Zn 2 SiO 4 ) film in the interface, with peak at 25.3° (220) 14 . In addition to the influence of work pressure on the crystallinity of the film, the diffraction patterns also show the influence of the applied power on the film characteristics.…”
Section: Discussionmentioning
confidence: 99%