2021
DOI: 10.1021/acsaelm.0c00889
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Carrier Dynamics in Thin Germanium–Tin Epilayers

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Cited by 13 publications
(11 citation statements)
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References 63 publications
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“…Carrier lifetimes in Ge 1Ày Sn y materials are expected to increase when grown on latticematched In x Al 1Àx As intermediate buffers, wherein defects and dislocations can be reduced to negligible levels, as opposed to the direct growth of Ge 1Ày Sn y on Si. [40][41][42][43][44][45][46][47][48][49] Lattice-matched Ge 1Ày Sn y /In x Al 1Àx As heterostructures can reduce the defect induced junction leakage and increase the carrier lifetime. Two design strategies are considered here to improve the Ge 1Ày Sn y material quality compared to the direct growth on Si: (a) the thickness of the Ge 1Ày Sn y epilayer on the AlAs/GaAs substrate below the critical layer thickness, and (b) the growth of the Ge 1Ày Sn y epilayer lattice matched to In x Al 1Àx As (no thickness constraints).…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Carrier lifetimes in Ge 1Ày Sn y materials are expected to increase when grown on latticematched In x Al 1Àx As intermediate buffers, wherein defects and dislocations can be reduced to negligible levels, as opposed to the direct growth of Ge 1Ày Sn y on Si. [40][41][42][43][44][45][46][47][48][49] Lattice-matched Ge 1Ày Sn y /In x Al 1Àx As heterostructures can reduce the defect induced junction leakage and increase the carrier lifetime. Two design strategies are considered here to improve the Ge 1Ày Sn y material quality compared to the direct growth on Si: (a) the thickness of the Ge 1Ày Sn y epilayer on the AlAs/GaAs substrate below the critical layer thickness, and (b) the growth of the Ge 1Ày Sn y epilayer lattice matched to In x Al 1Àx As (no thickness constraints).…”
Section: Introductionmentioning
confidence: 99%
“…Carrier lifetimes in Ge 1− y Sn y materials are expected to increase when grown on lattice-matched In x Al 1− x As intermediate buffers, wherein defects and dislocations can be reduced to negligible levels, as opposed to the direct growth of Ge 1− y Sn y on Si. 40–49…”
Section: Introductionmentioning
confidence: 99%
“…It can be explained that under illumination, EHPs are generated in GeSn. Because the non-radiative recombination process is much faster than the interband recombination process, the carriers are scattered into L valley, SRH centers, or interface/surface states [19]. As a result, the interband emission is suppressed while the trap-related emission is observed.…”
Section: Optical Absorption and External Quantum (Eqe) Spectramentioning
confidence: 99%
“…The poor-quality GeSn restricts the optical and electrical carrier dynamic in optoelectronic components [9]. For instance, GeSn photodetectors with high Sn contents show high dark leakage current, attributed to the poor material quality and the bandgap shrinking [10].…”
Section: Introductionmentioning
confidence: 99%
“…Electrically driven carrier dynamics were affected by trap states near the GeSn/Ge interface [151]. Because the nonradiative recombination process is much faster than the interband recombination process, photoexcited carriers are scattered into the L conduction band, SRH centers, or trap states at the interface/surface [152].…”
Section: Photoluminescence and Photoconductivitymentioning
confidence: 99%