Catalytic gas-phase fluorination of 1,1,2,3-tetrachloropropene to 2-chloro-3,3,3-trifluoropropene over the fluorinated Cr2O3-based catalysts

Mao, Wei; Kou, Liangang; Wang, Bo; Bai, Yanbo; Wang, Wei; Lü, Jian

doi:10.1016/j.apcata.2014.11.027

Cited by 15 publications

(7 citation statements)

References 23 publications

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“…公开报道的 HFO-1234yf 合成路线多达十几条, 其中以1,1,2,3-四氯丙烯(TCP)为原料经气相氟化、液相氟化及脱氯化氢的三步反应合成方法 (式(9)~(11)) 具有路线短、成本低的优点, 是最具工业化潜力的路线. 由于三步反应均涉及烯烃化合物, 且气相氟化和脱HCl的反应温度高、催化剂寿命短, 因此 TCP 法也是技术难度较大的路线 [34] .…”

Section: Hfo-1234yf的合成unclassified

“…该反应是典型的氢氟化反应, TCP经加成及连续的氟/氯交换反应生成 HCFO-1233xf (图2). 反应条件中, 温度对产物选择性的影响最大, 在260~290℃范围内可获得98%的选择性 [34] . 理论计算表明, 中间产物2,3-二氯-3,3-二氟丙…”

Section: Hfo-1234yf的合成unclassified

“…http://engine.scichina.com/doi/10.1360/N032017-00105 图 2 TCP气相氟化合成HCFO-1233xf反应历程 [34] 图 3 HCFC-244bb气相脱卤化氢反应(网络版彩图) [36]…”

Section: Hfo-1234yf的合成unclassified

“…降低表面HF的吸附能, 提高参与反应的活泼氟原子浓度 [28] ; La、Y可促进氟化预处理过程中高价CrOxFy物种的形成 [34,57] ; Mg可与Cr物种形成MgCrOxFy结构, 降低烯烃副产物的生成, 大幅提升催化剂稳定性 [58] ; Ni 可抑制脱卤化氢副反应的发生 [59,60] . 图 4 F-Cr2O3催化剂表面Cr2p结合能谱图 [54] 图 5 Cr/AlF3催化剂表面活性物种示意图 [55] HF反应, 碱性位发生脱HCl反应.…”

Section: 助剂添加可进一步改善氟化催化剂的性能 Zn可unclassified

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Manufacture of hydrofluorocarbons and hydrofluoroolefins as the CFCs-alternatives: from fundamental of catalytic reaction to commercialization

Zhang¹,

Mao²,

Wang³

et al. 2017

Sci. Sin.-Chim

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Section: Hfo-1234yf的合成unclassified

“…http://engine.scichina.com/doi/10.1360/N032017-00105 图 2 TCP气相氟化合成HCFO-1233xf反应历程 [34] 图 3 HCFC-244bb气相脱卤化氢反应(网络版彩图) [36]…”

Section: Hfo-1234yf的合成unclassified

Section: 助剂添加可进一步改善氟化催化剂的性能 Zn可unclassified

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Manufacture of hydrofluorocarbons and hydrofluoroolefins as the CFCs-alternatives: from fundamental of catalytic reaction to commercialization

Zhang¹,

Mao²,

Wang³

et al. 2017

Sci. Sin.-Chim

Self Cite

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“…HFC-134a can be obtained by the successive fluorination of trichloroethene with HF over trivalent metal fluorides or oxides as catalysts [6]. Vapour phase catalytic fluorination using anhydrous hydrogen fluoride over fluorided catalysts is a widely adopted route for the industrial scale production of chlorofluoroalkanes, and is also a route to HFO compounds [7]. A number of studies have reported the use of fluorided chromia as a catalyst for the fluorination of CFCs.…”

Section: Introductionmentioning

confidence: 99%

Zinc promoted alumina catalysts for the fluorination of chlorofluorocarbons

Jones

Hutchings

Scott

et al. 2018

Journal of Catalysis

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A range of catalysts consisting of zinc impregnated -Al2O3 has been examined for the fluorination of chlorofluorocarbons. Addition of zinc to -Al2O3 promotes steady state fluorination of CF2ClCFCl2 (CFC-113) to 1,1,1,2-tetrafluoro-2,2-dichloroethane (CFC-114a). Zinc promotion of fluorination activity was maximised at 6.5 wt%. Temperature programmed reaction (TPR) studies on pre-fluorided catalysts show that CCl4 is fluorinated by a sequential mechanism, with CCl3F a primary product and CCl2F2 a secondary product. The addition of zinc to -Al2O3 resulted in a low temperature feature in the TPR profile, and further analysis shows that there is a strong correlation between catalyst activity for CFC-113 fluorination and the concentration of fluorine associated with this low temperature feature. As the site population of the low temperature feature increases the apparent activation energy for the CFC-113 fluorination process decreases. Higher temperature HF pre-treatment resulted in a significant reduction of the population of this low temperature site compared to the standard conditions without pre-treatment, indicating that active fluorine consists of labile surface bonded H-F, rather than a metal fluoride such as AlF3 or ZnF2. Based on experiments investigating highly dispersed zinc on an activated carbon support, zinc adjacent to an Al 3+ ion is required for fluorination, since this allows adsorption of active HF in close proximity to a Lewis acid site, where the CFC can adsorb.

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Organofluorine Chemical Gases of Industrial Importance in Semiconductor Materials Processing

Syvret¹

2022

PATAI'S Chemistry of Functional Groups

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Organofluorine chemical (OFC) gases are important products of the fluorochemicals industry and find major usage as essential materials that largely impact semiconductor materials processing in the creation of computer chip technologies. These OFC gases provide highly reactive sources of fluorine and fluorocarbon radical species and thus form the foundation upon which plasma‐based etching and chamber cleaning processes are built. An important aspect of OFC gases is their fluorine to carbon (F:C) ratio, a parameter that reflects their reactivity in plasma‐based processes of importance for integrated circuit (IC) fabrication technology. OFC gases used in the semiconductor materials‐processing area are prepared on an industrial scale through a variety of synthetic processes. These processes include direct and indirect addition of elemental fluorine (F 2 ), fluorine substitution, halogen exchange, hydrogen addition/dehydrofluorination, pyrolysis, and building‐block methodologies.

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Catalytic gas-phase fluorination of 1,1,2,3-tetrachloropropene to 2-chloro-3,3,3-trifluoropropene over the fluorinated Cr2O3-based catalysts

Cited by 15 publications

References 23 publications

Manufacture of hydrofluorocarbons and hydrofluoroolefins as the CFCs-alternatives: from fundamental of catalytic reaction to commercialization

Manufacture of hydrofluorocarbons and hydrofluoroolefins as the CFCs-alternatives: from fundamental of catalytic reaction to commercialization

Zinc promoted alumina catalysts for the fluorination of chlorofluorocarbons

Organofluorine Chemical Gases of Industrial Importance in Semiconductor Materials Processing

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