2012
DOI: 10.1016/j.vacuum.2012.05.008
|View full text |Cite
|
Sign up to set email alerts
|

Cathodic cage plasma nitriding (CCPN) of austenitic stainless steel (AISI 316): Influence of the different ratios of the (N2/H2) on the nitrided layers properties

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
19
0
4

Year Published

2014
2014
2023
2023

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 58 publications
(23 citation statements)
references
References 24 publications
0
19
0
4
Order By: Relevance
“…The cathodic cage plasma deposition (CCPD) was developed by Alves et al 1 and has been employed for depositing a variety of coatings on different substrates [1][2][3][4][5][6][7][8][9] . In the CCPD process, the samples are inserted on an alumina insulator disk that is located inside a cage with uniformly distributed round holes of fixed diameter, so that the plasma acts on the cage and not on the sample surface, avoiding possible defects that are commonly formed during conventional plasma deposition [1][2][3][4][5][6][7][8][9] .…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The cathodic cage plasma deposition (CCPD) was developed by Alves et al 1 and has been employed for depositing a variety of coatings on different substrates [1][2][3][4][5][6][7][8][9] . In the CCPD process, the samples are inserted on an alumina insulator disk that is located inside a cage with uniformly distributed round holes of fixed diameter, so that the plasma acts on the cage and not on the sample surface, avoiding possible defects that are commonly formed during conventional plasma deposition [1][2][3][4][5][6][7][8][9] .…”
Section: Introductionmentioning
confidence: 99%
“…In the CCPD process, the samples are inserted on an alumina insulator disk that is located inside a cage with uniformly distributed round holes of fixed diameter, so that the plasma acts on the cage and not on the sample surface, avoiding possible defects that are commonly formed during conventional plasma deposition [1][2][3][4][5][6][7][8][9] . The CCPD technique has been used for treating not only metallic materials but also electrical insulator materials [1][2][3][4] , and it produces coatings that have high uniformity.…”
Section: Introductionmentioning
confidence: 99%
“…[21][22][23][24] Several researchers have reported the effects of nitriding parameters such as the distance between screen and sample, screen size, gas pressure, gas composition, sample geometry, and bias voltage on ASPN properties. [25][26][27][28][29][30][31][32][33][34][35][36][37][38] However, little information has been reported on the effect of the screen's open area ratio on ASPN properties. In this study, ASPN has been performed on austenitic stainless steel by using three types of screens with various open area ratios to investigate the effect of the screen's open area on the nitriding properties.…”
Section: Introductionmentioning
confidence: 99%
“…The methods of the second group include direct ion-plasma effect on the metal surface by a powerful short-pulse ion radiation or intense ion beams. They are applied, for example, in plasma-immersion ion implantation [3][4][5][6].…”
Section: Introductionmentioning
confidence: 99%
“…The methods of the second group include direct ion-plasma effect on the metal surface by a powerful short-pulse ion radiation or intense ion beams. They are applied, for example, in plasma-immersion ion implantation [3][4][5][6].The use of high-power compression plasma fl ows for the above-mentioned purposes opens new possibilities for modifi cation of the surface characteristics of various materials. The action of such fl ows on the metal surface makes it possible to form layers on this surface whose structural-phase composition has unique mechanical properties [7][8][9][10][11].…”
mentioning
confidence: 99%