Influence of the plasma nitriding conditions on the chemical and morphological characteristics of TiN coatings deposited on silicon

Neto, João Valério de Souza; Freitas, Ricardo Silva de; Neto, Bartolomeu Cruz Viana; Santos, Francisco Eroni Paz dos; Nascente, Pedro Augusto de Paula; Tallarico, Denise Aparecida; Mastelaro, Valmor Roberto; Souza, Rômulo Ribeiro Magalhães de

doi:10.17563/rbav.v37i2.1083

Cited by 3 publications

(3 citation statements)

References 38 publications

(69 reference statements)

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“…This indicates the beginning of the densification and smoothening of the films. The transition from roughening mechanism, due to the limited mobility of surface defects (Stage I) [37] to the smoothing mechanism controlled by the surface diffusion effect (Stage II) [43] is clearly demonstrated by the disappearance of the faceted surface (Fig. 6h).…”

Section: Microstructure and Morphologymentioning

confidence: 95%

“…The low-frequency scattering caused by acoustical phonons (TA and LA modes) is related to vibrations of the heavier metal atoms, while optical range scattering (TO and LO) refers to vibrations of the lighter non-metal ions [37]. Furthermore, an increase in the intensity of the optical phonon band suggests the formation of metallic vacancies, while an increase in the intensity of the acoustical band indicates a nitrogen vacancy [38].…”

Section: Raman Spectroscopymentioning

confidence: 99%

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Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

Kehal¹,

Saoula²,

Abaidia³

et al. 2021

Surface and Coatings Technology

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Ti-Cr-N coatings were deposited on Si (100) and AISI D2 tool steel substrates by reactive DC magnetron cosputtering technique from titanium and chromium target in mixed Ar/N 2 atmosphere. The Ar/N 2 ratio effects on the chemical composition, structure, morphology, intrinsic stress and mechanical properties of the Ti-Cr-N coatings were investigated. The growing process of Ti-Cr-N coatings can be divided into three stages: Stage I, in poisoning mode (low flow ratio 1 < Ar/N 2 ≤ 1.4), Stage II, in transition mode (intermediate flow ratio 1.4 ≤ Ar/N 2 ≤ 3) and Stage III in metallic mode (Ar/N 2 > 3). For all samples, XRD analysis shown the formation of mixed nitrides phases. In stage I, Ti 2 N, TiN 0.3 , and hexagonal-Cr 2 N phases were observed. In Stage II, TiN 0.3 , Cr 2 N, and cubic-TiN phases were formed, while only TiN and Cr 2 N are observed in stage III. The coatings deposited with Ar/N₂ ratio of 3 shows the largest hardness of 24 GPa which is attribute to the dense structure and smoother surface morphology. The properties of the films are discussed in terms of evolution growth stages resulting by the variation of Ar/N 2 flow ratios.

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Section: Microstructure and Morphologymentioning

confidence: 95%

Section: Raman Spectroscopymentioning

confidence: 99%

Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

Kehal¹,

Saoula²,

Abaidia³

et al. 2021

Surface and Coatings Technology

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show abstract

“…In 2017, Silva et al [71] carried out the titanium nitride synthesis on a glass substrate and reported that the rate of film deposition and film roughness increases with an increase in the thickness of the cathodic cage lid. In 2018, Neto et al [72] grew titanium nitride coating on silicon substrates using numerous gasses composition (1:3 and 3:1 of N 2 − H 2 mixture), processing temperature (300, 350 °C), and processing time (1-4 h). The microstructural images of the sample processed at a low temperature of 300 °C with 1 h processing time revealed that the synthesized coating was not uniform and appears to be uniform with an increase in processing time.…”

Section: Ccpd For Titanium Nitride Synthesismentioning

confidence: 99%

Synthesis of TiN and TiO2 thin films by cathodic cage plasma deposition: a brief review

Abreu

Naeem

Borges

et al. 2020

J Braz. Soc. Mech. Sci. Eng.

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The cathodic cage plasma deposition (CCPD) is an advanced technique recently developed from an active screen plasma nitriding system, which has been used for thin film deposition such as titanium nitride and titanium dioxide (TiO 2). These coatings can improve the physical, mechanical, and optical properties of numerous materials, and such coatings can be developed by several techniques. Unfortunately, the conventional deposition techniques exhibit certain drawbacks, including high cost, the complexity of the operation, very low pressure, and high processing temperature; as a result, CCPD is an advantageous technique. In this review, brief information on the deposition of titanium nitride and oxide coatings on steel alloys, titanium, glass, and silicon substrates, and the effect of control parameters on deposition efficiency is provided. The effectiveness of this system for the synthesis of thin films on various substrates, including insulators and conductors, is also summarized. The recent developments and applications of CCPD for titanium-based coatings are described in detail.

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Synthesis of biocompatible coating on Ni-Cr alloy by cathodic cage plasma processing technique as anti-pathogenic bacteria for medicinal applications

Asghar

Yousaf²,

Huwaimel

et al. 2023

Phys. Scr.

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The current research work reports the deposition of titanium-based multilayer coating (TiO/TiN) on Ni-Cr metallic alloy by a cathodic cage plasma processing technique using a titanium cage along with various combinations of gas mixtures i.e., N2-H2-Ar-O2 at 400 oC. The samples were characterized using X-ray photoelectron spectroscopy (XPS), which revealed the surface coating of TiO/TiN with Ti 2p at 462 eV, N 1s at 406 eV and O 1s at 530.09 eV. The X-ray diffraction (XRD) analysis confirmed the polycrystalline structure in the titanium-based coating with (111) for TiO/TiN and a crystallite size of 32nm. Scanning electron microscopy (SEM) and X-ray dispersive spectroscopy (EDX) analysis of titanium-based TiO/TiN coatings was well correlated with the above mentioned findings. Corrosion analysis using polarization potentio-dynamic plots (PDP) and electrochemical impedance spectroscopy (EIS) revealed a significant improvement in various corrosion parameters like corrosion resistance, corrosion rate, surface porosity, corrosion protection efficiency, impedance, and charge transfer resistance. A spectrophotometer was used to measure the leaching of toxic ions (Ni, Cr) from untreated and treated specimens in NaCl electrolyte. Findings revealed efficient antibacterial activity of TiO/TiN-coated specimens against E. coli and S. aureus as compared to untreated samples. This work will be helpful for understanding the biological features of metallic materials for medicinal applications.

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Influence of the plasma nitriding conditions on the chemical and morphological characteristics of TiN coatings deposited on silicon

Abstract: ABSTRACT

Cited by 3 publications

References 38 publications

Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

Synthesis of TiN and TiO2 thin films by cathodic cage plasma deposition: a brief review

Synthesis of biocompatible coating on Ni-Cr alloy by cathodic cage plasma processing technique as anti-pathogenic bacteria for medicinal applications

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