“…In our experiments, we found the best oxygen concentration is 4.29%, the resistivity of the films is 2.95 Â 10 À4 V cm, the carrier concentration is 3.508 Â 10 20 cm À3 and Hall mobility is as high as 60.32 cm 2 / V s. The resistivity of the films prepared by DC reactive magnetron sputtering is lower than that prepared by RF reactive sputtering [6], but slightly higher than that prepared by RF reactive magnetron sputtering and DC reactive sputtering [5,7], while the Hall mobility of the films prepared by DC reactive magnetron sputtering is higher than that prepared by other techniques [5][6][7]. As the demand for thinner and higher performance devices increases, future TCOs are demanded to have not only lower resistivity but also higher optical transparency [4]. The resistivity is inversely proportional to the carrier concentration and mobility; nevertheless, higher carrier concentration will decrease optical transparency.…”