Ultrablack
materials are distinguished by their extremely low reflectivity
and high absorptivity, which can be used to increase photovoltaic
cell efficiency, capture stray light, and design radar camouflage.
Black silicon is a type of ultrablack material, the absorptivity of
which still has room for improvement. Here, nanostructured black silicon
is prepared by a metal-assisted chemical etching method, in which
chloroauric acid (HAuCl4) acts as the catalyst. Furthermore,
the study demonstrates that due to the deposition of a few layers
of PtS2 the number of “hot spots” between
the sidewall gaps of bamboo shoot-like protrusions is significantly
increased, thereby further improving the absorption of black silicon
and enhancing light suppression. The few-layer PtS2 was
densely grown on the black silicon by combining the physical vapor
deposition (PVD) and the chemical vapor deposition (CVD) methods.
Next, the enhanced Raman property of black silicon was explored. These
results provide a new idea for the manufacture of excellent photovoltaic
and optoelectronic devices in which very high absorption is necessary.