Chalcogen interdiffusion in PbSe/PbTe heterostructures

Formation of PbTe nanofilms by electrochemical atomic layer deposition (ALD)

“…One of the major drawbacks of these techniques is the use of high temperatures for the growth of films which results in heatinduced interdiffusion [27] of elements in adjacent structure layers, which can degrade deposit quality. Electrodeposition is therefore an appealing technique for the formation of complex compound semiconductor structures, as it can be performed at or near room temperature, minimizing interdiffusion.…”