Challenges in Atomic Layer Deposition

Leskelä, Markku

doi:10.1002/9783527639915.ch17

Cited by 5 publications

(2 citation statements)

References 145 publications

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“…The surface and subsurface growth of Al 2 O 3 into the PBS matrix is due to the limited time for the precursors to diffuse into the polymer bulk during the ALD process. 28 Interestingly, the subsurface growth of Al 2 O 3 during ALD further corroborates the view of extremely high TMA and H 2 O diffusivities in PBS.…”

Section: Resultssupporting

confidence: 71%

“…In this case, O and Al distributions indicate the presence of a very high concentration of Al 2 O 3 in the region close to the surface of the PBS sample. The surface and subsurface growth of Al 2 O 3 into the PBS matrix is due to the limited time for the precursors to diffuse into the polymer bulk during the ALD process . Interestingly, the subsurface growth of Al 2 O 3 during ALD further corroborates the view of extremely high TMA and H 2 O diffusivities in PBS.…”

Section: Resultssupporting

confidence: 52%

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Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Motta

Seguini

Perego

et al. 2022

ACS Appl. Polym. Mater.

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The introduction of inorganic materials into biopolymers has been envisioned as a viable option to modify the optical and structural properties of these polymers and promote their exploitation in different application fields. In this work, the growth of Al 2 O 3 in freestanding ∼30-μm-thick poly(butylene succinate) (PBS) films by sequential infiltration (SIS) at 70 °C via trimethylaluminum (TMA) and H 2 O precursors was investigated for the first time. The incorporation of Al 2 O 3 into the PBS matrix was clearly demonstrated by XPS analysis and SEM-EDX cross-sectional images showing a homogeneous Al 2 O 3 distribution inside the PBS films. Raman measurements on infiltrated freestanding PBS show a reduction of the signal related to the ester carbonyl group as compared to pristine freestanding PBS films. Accordingly, FTIR and NMR characterization highlighted that the ester group is involved in polymer–precursor interaction, leading to the formation of an aliphatic group and the concomitant rupture of the main polymeric chain. Al 2 O 3 mass uptake as a function of the number of SIS cycles was studied by infiltration in thin PBS films spin-coated on Si substrates ranging from 30 to 70 nm. Mass uptake in the PBS films was found to be much higher than in standard poly(methyl methacrylate) (PMMA) films, under the same process conditions. Considering that the density of reactive sites in the two polymers is roughly the same, the observed difference in Al 2 O 3 mass uptake is explained based on the different free volume of these polymers and the specific reaction mechanism proposed for PBS. These results assessed the possibility to use SIS as a tool for the growth of metal oxides into biopolymers, paving the way to the synthesis of organic–inorganic hybrid materials with tailored characteristics.

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Section: Resultssupporting

confidence: 71%

Section: Resultssupporting

confidence: 52%

Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Motta

Seguini

Perego

et al. 2022

ACS Appl. Polym. Mater.

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Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

2012

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Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.

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Nanoskalige Oberflächenstrukturierung mittels Atomlagenabscheidung

Sobel

Heß

2015

Angewandte Chemie

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Das Interesse an der kontrollierten Strukturierung von Oberflächen ergibt sich aus einer Vielzahl von Bereichen, welche die mikroelektronische Bauelementherstellung, optische Geräte, Biosensorik, (Elektro‐, Photo‐)Katalyse, Batterien, Solarzellen, Brennstoffzellen und Sorption einschließen. Ein einzigartiges Merkmal der Atomlagenabscheidung (ALD) besteht darin, dass konforme, gleichmäßige Beschichtungen auf beliebig geformten Materialien mit kontrollierten atomaren Schichtdicken erhalten werden können. In diesem Kurzaufsatz diskutieren wir das Potenzial der ALD zur nanoskaligen Strukturierung von Oberflächen und betonen dabei die vielseitigen Anwendungen im Hinblick auf die Strukturierung planarer und pulverförmiger Substrate. Berücksichtigt man die jüngsten Fortschritte bei der Anwendung der ALD auf poröse Substrate, ist nun sogar die nanoskalige Strukturierung von Materialien mit großer spezifischer Oberfläche realisierbar. Dies ermöglicht neuartige Anwendungen, beispielsweise auf den Gebieten der Katalyse und der regenerativen Energien.

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Challenges in Atomic Layer Deposition

Cited by 5 publications

References 145 publications

Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

Nanoskalige Oberflächenstrukturierung mittels Atomlagenabscheidung

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Challenges in Atomic Layer Deposition

Cited by 5 publications

References 145 publications

Sequential Infiltration Synthesis of Al2O3 in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Sequential Infiltration Synthesis of Al2O3 in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

Nanoskalige Oberflächenstrukturierung mittels Atomlagenabscheidung

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Product

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Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism

Sequential Infiltration Synthesis of Al₂O₃ in Biodegradable Polybutylene Succinate: Characterization of the Infiltration Mechanism