1999
DOI: 10.1016/s1874-5903(99)80011-1
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Chapter 5 Multilayer dielectrics for memory applications

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Cited by 3 publications
(3 citation statements)
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“…Frenkel Poole (FP) conduction is considered the primary source of charge transfer with fields applied across SiO 2 and Si 3 N 4 films over 10 nm [5,59] Charge traps can be generated in SiO 2 under thermally assisted electric fields of 1.5 MV/cm [65,66] . The hot carrier electrons injected into the oxide are capable of releasing hydrogen from defect locations near the anode surface when the electron energy is 2eV or greater.…”
Section: Corona Chargingmentioning
confidence: 99%
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“…Frenkel Poole (FP) conduction is considered the primary source of charge transfer with fields applied across SiO 2 and Si 3 N 4 films over 10 nm [5,59] Charge traps can be generated in SiO 2 under thermally assisted electric fields of 1.5 MV/cm [65,66] . The hot carrier electrons injected into the oxide are capable of releasing hydrogen from defect locations near the anode surface when the electron energy is 2eV or greater.…”
Section: Corona Chargingmentioning
confidence: 99%
“…Annealing samples in the temperature range of 200°C to 300°C releases the hydrogen from Si and N bonds in silicon nitride leaving them as susceptible trapping locations [5].…”
Section: Corona Chargingmentioning
confidence: 99%
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