2003
DOI: 10.1049/ip-map:20030413
|View full text |Cite
|
Sign up to set email alerts
|

Characterisation of TFMS lines fabricated using photoimageable thick-film technology

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2005
2005
2021
2021

Publication Types

Select...
3
3

Relationship

2
4

Authors

Journals

citations
Cited by 10 publications
(3 citation statements)
references
References 11 publications
0
3
0
Order By: Relevance
“…High impedances can be fabricated by increasing the dielectric height and using more printing steps, which is used to design microwave frequency circuits. 26…”
Section: Final Structurementioning
confidence: 99%
“…High impedances can be fabricated by increasing the dielectric height and using more printing steps, which is used to design microwave frequency circuits. 26…”
Section: Final Structurementioning
confidence: 99%
“…MCM-D, using spin coating of dielectrics and evaporation of metals, has demonstrated excellent performance but can require relatively slow and complex fabrication processes [6]. Photoimageable thick film technology, with modern high quality materials and the capability to fabricate high resolution physical geometry is considered as a viable approach to the realisation of ceramic-based multilayer MCMs [7][8][9]. It is best suited to medium volume microwave and millimetre wave wireless applications.…”
Section: Introductionmentioning
confidence: 99%
“…To address the lack of precision in thick film technology, modern thick-film materials (photoimageable) are found to be well placed to meet these demanding requirements, as the process is straightforward and at the same time they offer low conductor and dielectric loss, good surface finish and the ability to realise fine conductor geometries (line width of 20m comfortably). The photoimageable thick film is used previously to developed dielectric-filled rectangular waveguides (substrate-integrated waveguides) and components successfully up to 100GHz[ I], The performance of thin film microstrip (TFM) lines using this technology on various substrates and that of individual components up to X-band has been reported [2][3][4][5]. To realize millimetre-wave multi-chip-module (MCM) using photoimageable thick film technology, a large number of multilayer and miniaturised components have been developed from 3 GHz to 65GHz with excellent performance.…”
Section: Introductionmentioning
confidence: 99%