1996
DOI: 10.1007/bf02666622
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Characteristics and device applications of erbium doped III-V semiconductors grown by molecular beam epitaxy

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Cited by 31 publications
(15 citation statements)
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“…The size of these precipitates was found to depend on growth temperature, resulting in ErAs particles ranging from about 1.2-3 nm in diameter for samples grown between 550 and 605 1C [18,19]. These ErAs precipitates were found to be detrimental to the photoluminescence properties of both the 4f transition in the Er atoms and the inter-band transitions of the GaAs matrix making the material ill-suited for light emitting devices [19]. However, like the As precipitates in LTG GaAs, the ErAs particles were also shown to reduce the photo-generated carrier lifetime.…”
Section: Er-doped Iii-v Semiconductorsmentioning
confidence: 97%
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“…The size of these precipitates was found to depend on growth temperature, resulting in ErAs particles ranging from about 1.2-3 nm in diameter for samples grown between 550 and 605 1C [18,19]. These ErAs precipitates were found to be detrimental to the photoluminescence properties of both the 4f transition in the Er atoms and the inter-band transitions of the GaAs matrix making the material ill-suited for light emitting devices [19]. However, like the As precipitates in LTG GaAs, the ErAs particles were also shown to reduce the photo-generated carrier lifetime.…”
Section: Er-doped Iii-v Semiconductorsmentioning
confidence: 97%
“…Initial studies of Er-doped GaAs showed the solubility limit around 7 Â 10 17 cm À3 for typical MBE growth conditions above which ErAs precipitates formed within the GaAs matrix [18]. The size of these precipitates was found to depend on growth temperature, resulting in ErAs particles ranging from about 1.2-3 nm in diameter for samples grown between 550 and 605 1C [18,19]. These ErAs precipitates were found to be detrimental to the photoluminescence properties of both the 4f transition in the Er atoms and the inter-band transitions of the GaAs matrix making the material ill-suited for light emitting devices [19].…”
Section: Er-doped Iii-v Semiconductorsmentioning
confidence: 98%
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“…Seminal studies of homogeneously-doped Er in GaAs showed that it can greatly increase the resistivity while promoting ultrafast behavior [5]. In contrast, Er incorporation into InGaAs creates a substantial drop in the bulk resistivity [6]. Substitutional incorporation of Er in GaAs is limited by the solubility limit at ~7x10 17 cm -3 , above which it tends to incorporate as ErAs nanoparticles [4].…”
Section: Introductionmentioning
confidence: 97%
“…Er 3þ -doped semiconductors are of significant interest due to their novel optical properties and the potential application in optical communication and full colour displays [1][2][3][4][5]. In particular, they show sharp emission near 1.54 mm, the low-loss wave-length of silica based optical fibres used in telecommunication system [4,5].…”
Section: Introductionmentioning
confidence: 99%