Characteristics of a Multilayer SiO_x(CH)_yN_z Film Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane/Ar/N₂O

Abstract

We show the existence of a new class of astrophysical objects where the self-gravity of the dust is balanced by the force arising from shielded electric fields on the charged dust. The problem of equilibrium dust clouds is formulated in terms of an equation of hydrostatic force balance together with an equation of state. Because of the dust charge reduction at high dust density, the adiabatic index reduces from two to zero. This gives rise to a mass limit M AS for the maximum dust mass that can be supported against gravitational collapse by these fields. If the total mass M D of the dust in the interstellar cloud exceeds M AS , the dust collapses, while in the case M D < M AS , equilibrium may be achieved. The physics of the mass limit is similar to the Chandrasekhar's mass limit for compact objects, such as white dwarfs and neutron stars.

Properties of SixNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film

“…1. All the spectra showed strong absorbance bands at around 840, 1170, 2150, and 3350 cm − 1 originated from Si-N bonding [6], Si-O bonding [7], Si-H bonding, and the bonding from -OH and N-H [8], respectively. The Si-N absorbance peak at the wave number around 840 cm − 1 was shifted to the high wave number (to 904 cm − 1 ) with increasing the ratio R. It is reported that Si-N band is shifted depending on the relative concentration of Si-H (2100 -2200 cm − 1 ) and N-H (around 3350 cm − 1 ) in the deposited films [9].…”

Characteristics of SiO[sub 2]-Like Thin Film Deposited by Atmospheric-Pressure PECVD Using HMDS∕O[sub 2]∕Ar

“…This low-temperature process involves the dissociation of volatile precursors with plasma and directing the reactive mixture onto the substrate surface. 6,7 However, PECVD requires an expensive vacuum system because it is operated at low pressures. This is particularly a problem when PECVD is used to deposit uniform films on an extremely large area substrate, such as flat-panel displays and flexible displays for the next generation, due to the difficulty in generating uniform plasma over a large area.…”

Comparison of HMDSO and HMDSN as precursors for high‐barrier plasma‐polymerized multilayer coating systems on polyethylene terephthalate films

“…This may be the case due to the fact that HMDSN molecules inherit lower intrinsic binding energies as compared with HMDSO molecules due to the significantly lower electronegativity of Nitrogen as compared with that of Oxygen. [ 14,16–18 ] HMDSN, therefore, needs less energy per molecule to decompose into fragments than HMDSO. The surplus energy may contribute to a higher degree of volume polymerization and, therefore, leads to deposition of larger fragments, which enable a faster coating.…”