2008
DOI: 10.1016/j.mee.2007.10.001
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Characteristics of DC magnetron sputtered ternary cobalt–nickel silicide thin films for ultra shallow junction devices

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Cited by 3 publications
(1 citation statement)
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“…RBS measurement using 2 MeV and 3 MeV He 2+ ion beam delivered from a tandem pelletron accelerator was carried out with a silicon surface barrier detector xed at a backscattering angle of 165 and the spectrum were analyzed using standard computer simulation soware SIMNRA 6.03. [33][34][35] RBS experimental parameters were kept identical during each set of experiment. Tapping mode AFM (Nanoscope IV, Veeco) and SEM (LIO430i) were performed to study the nanoring formation of the samples.…”
Section: Methodsmentioning
confidence: 99%
“…RBS measurement using 2 MeV and 3 MeV He 2+ ion beam delivered from a tandem pelletron accelerator was carried out with a silicon surface barrier detector xed at a backscattering angle of 165 and the spectrum were analyzed using standard computer simulation soware SIMNRA 6.03. [33][34][35] RBS experimental parameters were kept identical during each set of experiment. Tapping mode AFM (Nanoscope IV, Veeco) and SEM (LIO430i) were performed to study the nanoring formation of the samples.…”
Section: Methodsmentioning
confidence: 99%