2004
DOI: 10.1016/j.jcrysgro.2004.09.005
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Characteristics of InGaAsN/GaAsN quantum well lasers emitting in the 1.4-μm regime

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Cited by 9 publications
(6 citation statements)
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“…Figure 3(b) shows corresponding PR spectra of these samples. Moderate thermal treatments often improve the crystal quality and optoelectronic properties of dilute nitride alloys, [28][29][30][31][32] and this can account for the increase in the PR signal intensities for E − -related transition at about 1.2 eV after the annealing at 800 °C. The slight increase in the transition energy of the E − -related transition after 900 °C may originate from changes in the SL potential owing to the broadening of the N distribution profile.…”
Section: Resultsmentioning
confidence: 99%
“…Figure 3(b) shows corresponding PR spectra of these samples. Moderate thermal treatments often improve the crystal quality and optoelectronic properties of dilute nitride alloys, [28][29][30][31][32] and this can account for the increase in the PR signal intensities for E − -related transition at about 1.2 eV after the annealing at 800 °C. The slight increase in the transition energy of the E − -related transition after 900 °C may originate from changes in the SL potential owing to the broadening of the N distribution profile.…”
Section: Resultsmentioning
confidence: 99%
“…However, laser emission in MOCVD-grown samples at 41.4 mm remains challenging in this alloy system because of the diminished N incorporation in alloys with high In concentrations [4]. Furthermore, increased N incorporation, when successful, generally is accompanied by degradations of device performance [5,6], possibly due to the formation of In-N clusters, fluctuations in the well width, and/or local strains induced by the presence of N [7].…”
Section: Introductionmentioning
confidence: 99%
“…For 1300-nm emission wavelengths, diode lasers with active regions of highly strained InGaAsN quantum wells (QWs) [1], GaAsSb QWs [2,3], InAs quantum dots [4] and InGaAs-GaAsSb type-II QWs [5] have been demonstrated. However, in the 1550-nm regime, these methods encounter great difficulties in terms of wavelength limitation and device performance degradation [6,7]. To overcome this problem, a dilute-nitride type-II InGaAs-GaAsSb QW structure was proposed [8,9] for achieving 1550-nm on GaAs, as shown in the schematic band diagram in Fig.…”
Section: Introductionmentioning
confidence: 99%