Using high-resolution atomic force microscopy, we have shown extremely high stability of linear ferroelectric domains in epitaxial PbZr 0.2 Ti 0.8 O 3 thin films heated up to 735°C, a significant advantage for technological applications. An elevated transition temperature ϳ785°C is observed even in relatively thick ͑91 nm͒ films, despite relaxation of in-plane film-substrate lattice-mismatch-induced strain. We also demonstrate the negligible role of the film surface in determining the written domain-wall configuration, both by direct comparison of the surface roughness with domain-wall position at successive thermal cycles, and by measurements of domain-wall dynamics before and after heating. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2196482͔The diverse electronic and mechanical properties of ferroelectric perovskites make them particularly interesting for multifunctional devices in which their piezoelectric and pyroelectric properties, as well as their switchable ferroelectric polarization, can be exploited. In addition, local control of polarization by atomic force microscopy ͑AFM͒, combined with oxide growth techniques by which epitaxial single-crystal quality thin films of these materials can be grown on numerous substrates, 1,2 including silicon, 3 allows significant gains to be envisaged in application parameters, such as frequency or information density. An important consideration for devices is thermal stability. For example, in surface acoustic wave ͑SAW͒ frequency filters, thermal effects are a primary cause of device failure, and there is great interest in developing temperature-compensated systems. 4 Recently, a prototype SAW filter was fabricated using ferroelectric domain structures in PbZr 0.2 Ti 0.8 O 3 as 1 -4 GHz range "piezoelectric interdigitated transducers" ͑PIT͒ ͑Ref. 5͒. This material, unlike many standard piezoelectrics, shows a positive temperature coefficient of delay of the transverse vibrational mode resonant frequency. Its use in combination with a negative-temperature-coefficient-of-delay substrate could thus allow compensation of quasistatic thermal effects, provided the ferroelectric domain structures remain stable in the −20-100°C range particularly important for applications. Investigating the effects of heating on ferroelectric domains in epitaxial thin films is thus of obvious practical importance. To understand these effects at the nanometer scale required for miniaturized devices, such studies should focus in particular on domain walls, whose static and dynamic behavior determines the stability and growth of domains in ferroelectric materials.We have recently shown that ferroelectric domain walls in epitaxial thin films are well described as elastic interfaces in the presence of random bond disorder and dipolar interactions, 6 within the theoretical framework developed for elastic objects in random media. 7 In such systems, domain walls are pinned by disorder, although a thermally activated nonlinear response is possible even for subcritical forces. However, the...