Characteristics of reactively sputtered niobium nitride thin films as diffusion barriers for Cu metallization

Huang, Chun‐Kai; Lai, Chih‐Huang; Tsai, Po-Hao; Huang, Hsing-An; Lin, J.‐C.; Lee, Chiapyng

doi:10.1007/s13391-012-2173-0

Cited by 14 publications

(7 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Thus, they suggested that the NbN was relatively better than Nb and TaN as a diffusion barrier for copper interconnects. [ 197 ] In addition to this, several researchers attempted to improve the mechanical and tribological properties of NbN films by using the codeposition sputtering technique. The metals such as silicon, [ 198 ] aluminum, [ 199 ] bismuth, [ 200 ] copper, [ 201 ] and silver [ 202 ] were commonly engaged for codeposition along with niobium for the formation of composite nitrides in various studies.…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

View full text Add to dashboard Cite

Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

show abstract

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

View full text Add to dashboard Cite

show abstract

“…Нитрид ниобия ввиду комбинации своих уникальных физических и химических свойств имеет множество различных применений. Высокая температура плавления, химическая и механическая стойкость [1,2], относительно хорошая электрическая проводимость дают возможность использовать этот материал в качестве износостойких и биосовместимых покрытий [3,4], диффузионного барьера для создания медной металлизации [5] и электрода затвора для устройств на КМОП (комплементарная логика с транзисторами на металлоксид-полупроводнике) [6]. Также множество применений этого материала связано с его сверхпроводящими свойствами.…”

Section: Introductionunclassified

Исследование Ультратонких Сверхпроводящих Пленок Нитрида Ниобия, Полученных Методом Атомно-Слоевого Осаждения

Шибалов¹,

Порохов²,

Мумляков³

et al. 2021

Журнал Технической Физики

View full text Add to dashboard Cite

This publication presents a method for deposition of ultrathin superconducting NbNx films by atomic layer deposition enhanced by plasma with metal-organic precursor and a gas mixture of H2/Ar used as reactant. The obtained films characterized by measuring of sheet resistance, ellipsometry, atomic force microscopy, and superconducting characteristics measurements. The optimal parameters of the H2/Ar gas ratio was defined at which sheet resistance of NbNx films was minimal. A comparative analysis of sheet resistance of the obtained NbNx films performed. The dependence of the transition temperature to the superconducting state on the film thickness investigated. The transition temperature of 13.7 K and the critical current density of 0.7 MA/cm2 achieved. High film uniformity, precision control of the thickness and deposition temperature of 350°C makes it possible to use these films in the manufacture of field effect transistors and in functional devices for various purposes, working on the superconductivity effect.

show abstract

“…[1][2]. Due to their applicability in MEMS industry, thin films still present interest for researchers [3][4] and several methods have been used to deposit niobium nitride (NbN) thin films [5][6][7].…”

Section: Introductionmentioning

confidence: 99%

Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering

Șerdean

Crișan

Merie

et al. 2018

Powder Metallurgy and Advanced Materials

View full text Add to dashboard Cite

show abstract

Characteristics of reactively sputtered niobium nitride thin films as diffusion barriers for Cu metallization

Cited by 14 publications

References 22 publications

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Исследование Ультратонких Сверхпроводящих Пленок Нитрида Ниобия, Полученных Методом Атомно-Слоевого Осаждения

Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering

Contact Info

Product

Resources

About