Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier

Lee, J.H.; Jeong, Chang Hyun; Kim, H.B.; Lim, Jong Tae; Kyung, Se-Jin; Yeom, Geun‐Young

doi:10.1016/j.tsf.2006.07.056

Cited by 12 publications

(7 citation statements)

References 13 publications

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“…A similar tendency has also been confirmed in the case of plasmaenhanced CVD (PECVD) SiO x N y films using HMDS. 18) The decrease in carbon content leads to the formation of denser films and results in a better WVTR. We also hypothesize that the presence of a suitable amount of carbon atoms in the films might be the cause of compressive stress.…”

Section: Resultsmentioning

confidence: 99%

Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane

Ohdaira¹,

Matsumura²

2014

Jpn. J. Appl. Phys.

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Hexamethyldisilazane (HMDS) is utilized to deposit moisture barrier films by catalytic chemical vapor deposition (Cat-CVD). An increase in the thickness of silicon oxynitride (SiO x N y ) films leads to a better water–vapor transmission rate (WVTR), indicating that Cat-CVD SiO x N y films deposited using HMDS do not severely suffer from cracking. A WVTR on the order of 10−3 g m−2 day−1 can be realized by a Cat-CVD SiO x N y film formed using HMDS on a poly(ethylene terephthalate) (PET) substrate without any stacking structures at a substrate temperature of as low as 60 °C. X-ray reflectivity (XRR) measurement reveals that a film density of >2.0 g/cm3 is necessary for SiO x N y films to demonstrate an effective moisture barrier ability. The use of HMDS will give us safer production of moisture barrier films because of its non-explosive and non-toxic nature.

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Section: Resultsmentioning

confidence: 99%

Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane

Ohdaira¹,

Matsumura²

2014

Jpn. J. Appl. Phys.

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“…As all flexible polymer substrates can permeate water vapor and oxygen, the prevention of gas permeation into flexible devices has been an important problem. Therefore, several permeation barrier layers using inorganic oxide films have been proposed, such as silicon oxide (SiOx), silicon nitride (SiNx), and aluminium oxide (AlOx), have been widely used. Inorganic oxide films are however brittle and easily fractured when they are deformed due to the large difference between the elastic properties of oxide films and the polymer substrate .…”

Section: Introductionmentioning

confidence: 99%

Gas barrier and mechanical properties of a single‐layer silicon oxide film prepared by roll‐to‐roll PECVD system

Cho

Lee

et al. 2019

Plasma Processes & Polymers

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We presented a single‐layer silicon oxide (SiOx) barrier film with excellent moisture barrier performance and flexibility. High quality, continuous, and large‐area barrier film was deposited on polyethyleneterephthalate substrate using a roll‐to‐roll PECVD for large‐scale production. The effects of the reaction gas flow ratio of N2O/SiH4 (R) on the characteristics of the SiOx film were systematically analyzed in terms of the optical properties, surface roughness, film density, hardness, chemical composition, and water vapor transmission rate. The SiOx film exhibited the best film density, hardness, surface roughness, and superior barrier performance of 1.6 × 10−3 g · m−2 · d−2 at R = 1.5. The SiOx barrier film also exhibited excellent flexibility which bent up to 2 mm and withstood the repeated bending of 10 000 cycles.

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“…One of the common precursors used for the deposition of SiO x films is hexamethyldisiloxane (HMDSO) [14][15][16][17][18]. Furthermore, hexamethyldisilazane (HMDSN) is used in many applications for the deposition of silicon nitride, but also for SiO x films [22][23][24][25][26][27]. In comparison to silanes, both are easy to handle, but contain methyl groups, respectively [22,28].…”

Section: Introductionmentioning

confidence: 99%

“…Dissociation and reaction pathways in plasma processes of HMDSO and HMDSN [10,[45][46][47][48][49][50] as well as SiO x film growth [14][15][16][17][18][22][23][24][25][26][27] have been stated in literature. However, only little work has been published containing a systematic comparison of HMDSO and HMDSN based coatings, applied as interlayers and SiO x barrier coatings on polymers, under the same conditions, within the same setup and on equal substrates [51].…”

Section: Introductionmentioning

confidence: 99%

Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)

Mitschker

Schücke

Hoppe

et al. 2018

J. Phys. D: Appl. Phys.

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The effect of the selection of hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDSN) as a precursor in a microwave driven low pressure plasma on the deposition of silicon oxide barrier coatings and silicon based organic interlayers on polyethylene terephthalate (PET) and polypropylene (PP) substrates is investigated. Mass spectrometry is used to quantify the absolute gas density and the degree of depletion of neutral precursor molecules under variation of oxygen admixture. On average, HMDSN shows a smaller density, a higher depletion and the production of smaller fragments. Subsequently, this is correlated with barrier performance and chemical structure as a function of barrier layer thickness and oxygen admixture on PET. For this purpose, the oxygen transmission rate (OTR) is measured and Fourier transformed infrared (FTIR) spectroscopy as well as x-ray photoelectron spectroscopy (XPS) is performed. HMDSN based coatings exhibit significantly higher barrier performances for high admixtures of oxygen (200 sccm). In comparison to HMDSO based processes, however, a higher supply of oxygen is necessary to achieve a sufficient degree of oxidation, cross-linking and, therefore, barrier performance. FTIR and XPS reveal a distinct carbon content for low oxygen admixtures (10 and 20 sccm) in case of HMDSN based coatings. The variation of interlayer thickness also reveals significantly higher OTR for HMDSO based coatings on PET and PP. Barrier performance of HMDSO based coatings improves with increasing interlayer thickness up to 10 nm for PET and PP. HMDSN based coatings exhibit a minimum of OTR without interlayer on PP and for 2 nm interlayer thickness on PET. Furthermore, HMDSN based coatings show distinctly higher bond strengths to the PP substrate.

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Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier

Cited by 12 publications

References 13 publications

Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane

Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane

Gas barrier and mechanical properties of a single‐layer silicon oxide film prepared by roll‐to‐roll PECVD system

Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)

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