2021
DOI: 10.1088/1674-1056/abcfa2
|View full text |Cite
|
Sign up to set email alerts
|

Characterization and application in XRF of HfO2-coated glass monocapillary based on atomic layer deposition*

Abstract: Coating a glass monocapillary x-ray optics with high-density film is a promising way to improve transmission characteristics. For a long time, it has been a challenge to coat a high-density film in the inside of monocapillary with an extremely high length-to-diameter ratio. In this work, HfO2 film is deposited on the inner wall of a tapered glass monocapillary with length 9.9 cm, entrance diameter 596.4 μm, and exit diameter 402.3 μm by atomic layer deposition. The coated and uncoated monocapillaries are studi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 24 publications
0
2
0
Order By: Relevance
“…Si substrate was cleaned by standard wet clean. Then, the bottom electrode (TiN), the 10-nm-thick Zr-doped HfO 2 (HZO) thin film and top electrode (TiN and W) were deposited by atomic layer deposition [49,50] (ALD) in turn. The HZO thin films were crystallized in N 2 ambient and rapid thermal anneal (RTA) system of 550-650 • C. The composition of the HZO thin film was changed by controlling the deposition ratio of HfO 2 and ZrO 2 to realize the adjustment of ferroelectric intrinsic parameters (thermodynamic coefficients α, β and γ, etc) and form the ferroelectric capacitors with different Hf:Zr ratios.…”
Section: Experimental Details and Theoretical Model 21 Experimental D...mentioning
confidence: 99%
“…Si substrate was cleaned by standard wet clean. Then, the bottom electrode (TiN), the 10-nm-thick Zr-doped HfO 2 (HZO) thin film and top electrode (TiN and W) were deposited by atomic layer deposition [49,50] (ALD) in turn. The HZO thin films were crystallized in N 2 ambient and rapid thermal anneal (RTA) system of 550-650 • C. The composition of the HZO thin film was changed by controlling the deposition ratio of HfO 2 and ZrO 2 to realize the adjustment of ferroelectric intrinsic parameters (thermodynamic coefficients α, β and γ, etc) and form the ferroelectric capacitors with different Hf:Zr ratios.…”
Section: Experimental Details and Theoretical Model 21 Experimental D...mentioning
confidence: 99%
“…X-ray fluorescence (XRF) spectrometry is an established analytical tool for detecting trace amounts of material on a micrometer depth scale. [1,2] It has been applied in several research fields, such as chemical analysis, [3] mineral analysis, [4] archaeometry, [5] medicine, [6] jewelry identification [7] and environmental sciences. [8,9] In conventional XRF spectrometry, the angle of incidence of the primary x-ray beam is usually set to around 45 • to study the properties of relatively deep regions of the sample.…”
Section: Introductionmentioning
confidence: 99%