Characterization and Electrochemical Performance at High Discharge Rates of Tin Dioxide Thin Films Synthesized 
by Atomic Layer Deposition

Maximov, Maxim; Новиков, П. А.; Nazarov, D. V.; Rymyantsev, Aleksander; Silin, A. O.; Zhang, Y.; Popovich, Anatoliy

doi:10.1007/s11664-017-5701-8

Cited by 25 publications

(22 citation statements)

References 21 publications

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“…NiO is extremely promising as an anode material for thin-film lithium-ion batteries [5]. The value of the theoretical electrochemical capacity for NiO (718 mAh/g [6]) is close to the values for several other promising anode materials, such as SnO 2 (790 mAh/g) [7], CoO (715 mAh/g) [8], and MnO (650 mAh/g) [8]. The capacity of these oxide materials is more than twice the capacity of graphite (372 mAh/g) used in the industry of lithium-ion batteries [9].…”

Section: Introductionsupporting

confidence: 58%

Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries

et al. 2019

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Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp) 2 ) and bis(cyclopentadienyl) nickel(II) (NiCp 2 ) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp 2 was 200-300 • C, but the optimal Ni(MeCp) 2 growth per ALD cycle was 0.011-0.012 nm for both precursors at 250-300 • C. The films deposited using NiCp 2 and oxygen plasma at 300 • C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm 3 ) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28-30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge-discharge curves (U(C)).NiO nanofilms are produced using various methods [12] such as thermal spraying, pulsed laser deposition, sol-gel, spin-coating, dip-coating, chemical vapor deposition, and atomic layer deposition (ALD). ALD is the most promising technology because it provides control over the thickness and purity of coatings with high precision, and can deposit uniform surface coatings on of complex shape and even porous and high aspect ratio substrates [13][14][15]. This method could be a crucial factor for transition from 2D to 3D solid-state batteries (SSB), which are structured on 3D substrates with high aspect ratio instead of planar substrates. It could increase the energy density of SSB with the same thickness of the electrode to maintain the required conductivity of the layers [16]. ALD is based on a realization of the sequence of chemical reactions between gaseous reagents and the surface species of the substrate, separated in time by purges with an inert gas to prevent uncontrolled reactions between the reactants and the reaction products. Because of the self-limiting nature, this method allows the deposition of films in a layer-by-layer fashion and the control of the thickness with high precision [13].When selecting the deposition conditions via ALD, it is necessary to consider the stability and reactivity of the precursors. Many precursors have been tested for ALD NiO so far, but the most frequently used are shown in Table 1: nickel(II) acetylacetonate (Ni(acac) 2 ), bis(2,2,6,6-tetramethylheptane-3,5dionate)nickel(II) (Ni(thd) 2 ), bis(cyclopentadienyl) nickel(II) (NiCp 2 ), and NiCp 2 -based compounds such as ...

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Section: Introductionsupporting

confidence: 58%

Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries

et al. 2019

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“…Subsequently, Maximov et al. [ 59 ] and Nazarov et al. [ 60 ] also demonstrated that ALD SnO 2 thin film anodes on SS have excellent electrochemical performance.…”

Section: Ald For High‐capacity Anodes In Lithium‐ion Batteriesmentioning

confidence: 99%

“…This could be ascribed to the fact that, compared to bulk‐type micron‐sized electrode materials, nanoscale thin film electrodes can better accommodate the strain stress and have shorter pathways for both Li + and electron. [ 62 ] In addition, the film thickness, crystallinity, and composition have significant influence on the performance of thin film anodes, which can be facilely tuned in ALD processes through adjusting their ALD cycles, [ 63 ] deposition temperature, [ 59,60 ] dose ratio, [ 64 ] and precursors. [ 65 ]…”

Section: Ald For High‐capacity Anodes In Lithium‐ion Batteriesmentioning

confidence: 99%

Atomic Layer Deposition of High‐Capacity Anodes for Next‐Generation Lithium‐Ion Batteries and Beyond

Cao

Meng

2020

Energy & Environ Materials

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Electrification has great impacts on our modern society. To electrify future transportation, state‐of‐the‐art lithium‐ion batteries (LIBs) are still not sufficient in multiple aspects including cost, energy density, lifespan, and safety. To this end, next‐generation high‐energy LIBs and beyond are highly regarded. In this regard, high‐capacity anodes are undergoing intensive investigation, such as silicon, SnO2, and lithium metal. However, such anode materials are commonly experiencing large volume changes and related issues, which are reflected on mechanical degradation, capacity fading, low efficiency, and unsatisfactory lifetime. To address these challenges, many technical strategies have been investigated. In the past decade, atomic layer deposition (ALD) has emerged as a new promising technique enabling atomic‐scale surface modification and nanoscale design of high‐capacity anodes for high performance. In this review, recent ALD studies on developing high‐capacity anodes for LIBs and beyond are thoroughly summarized. In addition, ALD strategies and their effectiveness in pursing high‐energy LIBs and beyond are discussed. Particularly, we highlighted the latest advances of ALD for addressing the notorious issues associated with Li metal anodes. It is expected that this work will promote the applications of ALD in new battery systems.

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“…Numerous studies have addressed the preparation of individual components of thin-film SSLIBs by ALD, such as cathodes [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 , 24 , 25 , 26 ], anodes [ 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 ] and solid-state electrolytes [ 50 , 51 , 52 , 53 ]. Using several precursors in the ALD chamber allows the fabrication of all the SSLIB components using ALD equipment [ 12 ].…”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

et al. 2021

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Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

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Characterization and Electrochemical Performance at High Discharge Rates of Tin Dioxide Thin Films Synthesized by Atomic Layer Deposition

Cited by 25 publications

References 21 publications

Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries

Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries

Atomic Layer Deposition of High‐Capacity Anodes for Next‐Generation Lithium‐Ion Batteries and Beyond

Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

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