2004
DOI: 10.1016/j.elstat.2004.04.007
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Characterization and modeling of transient device behavior under CDM ESD stress

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Cited by 18 publications
(6 citation statements)
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“…Device physical effects reported by Willemen et al [13] strongly influence the device behavior during fast transients. The transient device series resistance can increase up to one order of magnitude during the fast rising slopes of CDM events.…”
Section: Transient Device Behaviormentioning
confidence: 96%
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“…Device physical effects reported by Willemen et al [13] strongly influence the device behavior during fast transients. The transient device series resistance can increase up to one order of magnitude during the fast rising slopes of CDM events.…”
Section: Transient Device Behaviormentioning
confidence: 96%
“…Hence, we determined the transient forward and reverse behavior of the n + -buried layer/p-substrate junction with vf-TLP measurements and TLP measurements using an equivalent buried layer/substrate test structure. Parameters for the forward behavior of the pn-junction were extracted for a model including the forward recovery effect as reported in [13]. Since high voltages occurred across the parasitic pn-junctions during the CDM circuit simulation, which exceeded even the high breakdown voltage V BD % 110 V of the n + -buried layer/substrate junction, the junction breakdown voltage and the substrate/buried layer series resistance were determined and added to the circuit models.…”
Section: Parasitic Pn-junctionsmentioning
confidence: 99%
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“…If the working conditions are inconsistent with the parameter-fitting conditions, the accuracy of the model will be significantly reduced. Willemen and Hsu [33,34] proposed an analytical model of MOSFET that used the parameters obtained from the device data tables and the parasitic parameters of the external circuit to simulate the high-frequency behavior of MOSFET. Y Yuan [35] proposed a MOSFET segmented behavior model that prioritizes runtime performance and convergence behavior, and is thus suitable for computer-based simulation analysis.…”
Section: Research Status Of Emi Modelingmentioning
confidence: 99%
“…Typically, a diode string or a DTSCR ESD protection structure utilizes either STI-diode or gated-diode to control ESD triggering. However, it is reported that, under CDM ESD stressing that features extremely fast pulse rise time (t r ∼200ps) and very short pulse duration (t d1 ∼1ns for the first peak) [13], transient voltage peaking right before the ESD triggering may occur that causes early ESD failures due to the delay in ESD triggering and rupture in the thin gate oxide [8]- [12]. Transient voltage peaking becomes a major CDM ESD protection design problem for ICs at sub-28nm nodes, which must be thoroughly understood.…”
Section: Introductionmentioning
confidence: 99%