Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Gautier, J.; Delmotte, F.; Bridou, Françoise; Ravet, M. F.; Varnière, Françoise; Roulliay, Marc; Adnot, Jérôme; Vickridge, Ian

doi:10.1007/s00339-007-4041-6

Cited by 23 publications

(19 citation statements)

References 12 publications

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“…Below 65 nm, single layers of a few metals like Pt [9,10], Ir [11], and Os [12], have a relatively high reflectance of up to ~20-35% in the ~45-70 nm range. In spite of the lack of transparent materials, moderately high reflectance, narrowband multilayer coatings based on the transparency of Sc [13][14][15], Tb [16,17], Gd [18], Yb [19], Eu [20], and Mg [21] films have been developed recently.…”

Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp 3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. 5962-5963 (1994). 9. G. F. Jacobus, R. P. Madden, and L. R. Canfield, "Reflecting films of platinum for the vacuum ultraviolet," J.Opt. Soc. Am. 53(9), 1084-1088 (1963). 10. W. R. Hunter, D. W. Angel, and G. Hass, "Optical properties of evaporated platinum films in the vacuum ultraviolet from 220 Å to 150 Å," J. Opt. Soc. Am. 69(12), 1695-1699 (1979). 11. G. Hass, G. F. Jacobus, and W. R. Hunter, "Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å," J. Opt. Soc. Am. 57(6), 758-762 (1967). 12. J. T. Cox, G. Hass, J. B. Ramsey, and W. R. Hunter, "Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 Å," J. Opt. Soc. Am. 63(4), 435-438 (1973 Robertson, "Density, sp 3 fraction, and cross-sectional structure of amorphous carbon films determined by x-ray reflectivity and electron energy-loss spectroscopy," Phys. Rev. B 62(16), 11089-11103 (2000). 32. F. Xiong, Y. Y. Wang, and R. P. H. Chang, "Complex dielectric function of amorphous diamond films deposited by pulsed-excimer-laser ablation of graphite," Phys. Rev. B Condens. Matter 48(11), 8016-8023 (1993). 33. S. Waidmann, M. Knupfer, J. Fink, B. Kleinsorge, and J. Robertson, "Electronic structure studies of undoped and nitrogen-doped tetrahedral amorphous carbon using high-resolution electron energy-loss spectroscopy," J.

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Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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“…Small tilt of the samples in the TEM column and interfaces roughness may be responsible for excessive values of the interface thickness. Besides the density of formed silicide can be lower than tabulated one, that exists with regards to thin films, 34,35 and actual silicide thickness may be larger.…”

Section: Small-angle Measurements At Hard X-rays (λ λ λ λ=0154 Nm)mentioning

confidence: 73%

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

et al. 2011

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Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (λ=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.

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“…A detailed description of the deposition system MP800 can be found elsewhere. 11,15 Briefly, we can use up to four different material targets (80 x 200 mm) for the deposition process. A substrate holder, which is approximately 127 mm in diameter, can be transferred from a loadlock system down to the deposition chamber without breaking vacuum.…”

Section: Multilayer Deposition and Characterizationmentioning

confidence: 99%

Single and multi-channel Al-based multilayer systems for space applications in EUV range

et al. 2013

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We report on further development of reflective multilayer coatings containing aluminum as low absorbing material for the extreme ultra-violet (EUV) applications, in particular for solar physics. Optimizations of the multilayer design and deposition process have allowed us to produce Al-based multilayers having relatively low interface roughness and record EUV reflectances in the range from 17 to 40 nm. The peak reflectance values of 56 % at 17.5 nm, 50 % at around 21 nm, and 42 % at 32 nm were achieved with new three-material multilayers Al/Mo/SiC and Al/Mo/B 4 C at near-normal incidence. We observe a good temporal stability of optical parameters of the multilayers over the period of 4 years. Moreover, the multilayer structure remains stable upon annealing at 100 °C in air during several weeks.We will discuss the optical properties of more complex Al-based systems with regard to the design of multilayer coatings that reflect more than one wavelength and reject some others within the spectral range from 17 to 40 nm. Such multichannel systems with enhanced reflectance and selectivity would provide a further advance in optical performance and compactness of EUV solar imaging instruments. We will discuss general aspects of design, optimization and fabrication of single-and multi-channel multilayer mirrors made with the use of aluminum. We will present recent results on the EUV reflectivity of multilayer coatings based on the Al/Mo/SiC and Al/Mo/B 4 C material combinations. Al-based multilayer systems are proposed as optical coatings in EUV telescopes of future space missions and in other EUV applications.

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Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Cited by 23 publications

References 12 publications

High reflectance ta-C coatings in the extreme ultraviolet

High reflectance ta-C coatings in the extreme ultraviolet

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

Single and multi-channel Al-based multilayer systems for space applications in EUV range

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