Characterization and Tribological Properties of W-Ti-N/Al-Si Multilayer Surface Coating for Iron Alloy Pistons

Chemaa, Khaled; Hassani, Salim; Gaceb, Mohamed

doi:10.1007/s11665-021-05996-7

Cited by 7 publications

(3 citation statements)

References 28 publications

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“…[ 292 ] It is also being explored for its biocompatibility in the field of biomedical engineering. [ 291 ]…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

“…There are some more studies whose results are comparable to the data presented in Figure 28. [287,290] Khamseh et al [291] produced WN and tungsten oxynitride films using reactive magnetron sputtering in an inert gas (Ar) atmosphere with a reactive mixture of O 2 and N 2 gases. The WN films displayed (111) orientation with the FCC W 2 N phase.…”

Section: Experimental Conditionmentioning

confidence: 99%

“…[292] It is also being explored for its biocompatibility in the field of biomedical engineering. [291] Figure 28. Variation of mean square roughness, hardness and elastic modulus with N 2 flow ratio for WN films deposited by HiPIMS and MF pulse system.…”

Section: Experimental Conditionmentioning

confidence: 99%

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Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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“…[ 292 ] It is also being explored for its biocompatibility in the field of biomedical engineering. [ 291 ]…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%