2004
DOI: 10.1016/j.surfcoat.2004.07.006
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of a hybrid PVD/PACVD system for the deposition of TiC/CaO nanocomposite films by OES and probe measurements

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
5
0

Year Published

2005
2005
2017
2017

Publication Types

Select...
6
4

Relationship

0
10

Authors

Journals

citations
Cited by 17 publications
(5 citation statements)
references
References 15 publications
0
5
0
Order By: Relevance
“…For MuBiNaFs deposition using SHScomposite targets, different methods were employed. The films were obtained by magnetron sputtering [374][375][376], ion implantation-assisted magnetron sputtering (IIAMS) [377][378][379], and а hybrid process involving sputter deposition and either inductively coupled plasma (ICP) [380][381][382] or an RF system for additional ionisation [383]. IIAMS was used to enhance film adhesion to the metal substrate via high-energy ion bombardment several minutes before and after the beginning of deposition.…”
Section: Shs In Surface Engineeringmentioning
confidence: 99%
“…For MuBiNaFs deposition using SHScomposite targets, different methods were employed. The films were obtained by magnetron sputtering [374][375][376], ion implantation-assisted magnetron sputtering (IIAMS) [377][378][379], and а hybrid process involving sputter deposition and either inductively coupled plasma (ICP) [380][381][382] or an RF system for additional ionisation [383]. IIAMS was used to enhance film adhesion to the metal substrate via high-energy ion bombardment several minutes before and after the beginning of deposition.…”
Section: Shs In Surface Engineeringmentioning
confidence: 99%
“…1) consists of two metal chambers of different sizes: a small-radius chamber where the driver is located (RF power deposition in the region z = (−2.5 ÷ −17.5) cm) and a bigradius chamber with plasma expanding from the driver. The design of the source-with metal walls of the entire source-is that of the inductively driven (by external coils) plasma sources, with a Faraday shield inside the driver region, which are used both in plasma processing technologies [3] and as negative ion sources [4]. The discharge is in an argon gas at pressure p = 50 mTorr.…”
Section: Particle and Energy Fluxes In A Two-chamber Plasma Source Stmentioning
confidence: 99%
“…Hybrid PVD-PECVD process is being used for synthesis of metal hydrogenated carbon nanocomposite (MeC/C(:H)) [6,[8][9][10][11][12][13] layers or DLC layers doped with metal (DLC:Me) [14][15][16][17]. For example nc-WC/a-C:H [18][19][20][21] or nc-TiC/a-C:H [9,[22][23][24] are reported to have good mechanical and tribological properties combining high hardness, good toughness with low friction coefficient and wear which makes these materials industrially attractive for different applications.…”
Section: Introductionmentioning
confidence: 99%